Andreas Klipp — 28 Patents at Basf Se

Andreas Klipp has been granted 28 US patents while listed as an inventor at Basf Se. The first was granted in 2007 and the most recent in June 2025. Andreas Klipp ranks #134,628 of 4,157,543 US inventors in our database (top 3.2%). Patent records list Andreas Klipp in Ludwigshafen, DE.

Issued Patents All Time

Showing 1–25 of 28 patents

Patent #	Title	Co-Inventors	Date
12331239	Composition and process for selectively etching a layer comprising an aluminium compound in the presence of layers of low-k materials, copper and/or cobalt	Joannes Theodorus Valentinus Hoogboom, Jhih Jheng Ke, Che Wei Wang, Yi-Ping Cheng	2025-06-17
12084628	Composition comprising a primary and a secondary surfactant, for cleaning or rinsing a product	I Chen Chou, Berthold Ferstl	2024-09-10
12024693	Imidazolidinethione-containing compositions for post-ash residue removal and/or for oxidative etching of a layer or mask comprising TiN	Joannes Theodorus Valentinus Hoogboom, Jhih Jheng Ke, Yi-Ping Cheng	2024-07-02
11742197	Cleavable additives for use in a method of making a semiconductor substrate	Christian Bittner, Simon Braun, Guenter Oetter, Yeni Burk	2023-08-29
11377624	Cleaning composition for post-etch or post ash residue removal from a semiconductor substrate and corresponding manufacturing process	Jhih Jheng Ke, Yi-Ping Cheng, Joannes Theodorus Valentinus Hoogboom	2022-07-05
11180719	Use of compositions comprising a siloxane-type additive for avoiding pattern collapse when treating patterned materials with line-space dimensions of 50 nm or below	Daniel LOEFFLER, Mei Chin SHEN, Sheng-Hsuan Wei, Frank Oliver Heinrich Pirrung, Lothar Alexander Engelbrecht +3 more	2021-11-23
11168239	Chemical-mechanical polishing composition comprising benzotriazole derivatives as corrosion inhibitors	Robert REICHARDT, Martin Kaller, Michael Lauter, Yuzhuo Li	2021-11-09
10865361	Composition for post chemical-mechanical-polishing cleaning	Christian Daeschlein, Max Siebert, Michael Lauter, Leonardus Leunissen, Ivan Garcia Romero +3 more	2020-12-15
10844325	Composition for post chemical-mechanical-polishing cleaning	Christian Daeschlein, Max Siebert, Michael Lauter, Peter Przybylski, Julian Proelss +4 more	2020-11-24
10844333	Composition for post chemical-mechanical-polishing cleaning	Christian Daeschlein, Max Siebert, Michael Lauter, Piotr Przybylski, Julian Proelss +4 more	2020-11-24
10647900	Chemical-mechanical polishing composition comprising benzotriazole derivatives as corrosion inhibitors	Robert REICHARDT, Martin Kaller, Michael Lauter, Yuzhuo Li	2020-05-12
10538724	Defect reduction rinse solution containing ammonium salts of sulfoesters	Christian Bittner, Guenter Oetter, Andrei Honciuc, Simon Braun	2020-01-21
10385295	Compositions for anti pattern collapse treatment comprising gemini additives	Andrei Honciuc, Guenter Oetter, Christian Bittner	2019-08-20
9891520	Use of surfactants having at least three short-chain perfluorinated groups in formulations for photo mask cleaning	Andrei Honciuc, Chu-Ya Yang	2018-02-13
9557652	Use of compositions comprising a surfactant and a hydrophobizer for avoiding anti pattern collapse when treating patterned materials with line-space dimensions of 50 nm or below	Andrei Honciuc, Günter Oetter, Christian Bittner	2017-01-31
9484218	Post ion implant stripper for advanced semiconductor application	ChienShin Chen, MeiChin Shen, ChiaHao Chan	2016-11-01
9275851	Aqueous, nitrogen-free cleaning composition and its use for removing residues and contaminants from semiconductor substrates suitable for manufacturing microelectronic devices	Vijay Immanuel Raman, Shyam Sundar Venkataraman, Raimund Mellies, Mingjie Zhong	2016-03-01
9236256	Use of surfactants having at least three short-chain perfluorinated groups RF for manufacturing integrated circuits having patterns with line-space dimensions below 50 NM	Dieter Mayer	2016-01-12
9223221	Photoresist stripping and cleaning composition, method of its preparation and its use	Simon Braun, Christian Bittner	2015-12-29
9184057	Method for manufacturing integrated circuit devices, optical devices, micromachines and mechanical precision devices having patterned material layers with line-space dimensions of 50 nm and less	Guenter Oetter, Sabrina Montero Pancera, Andrei Honciuc, Christian Bittner	2015-11-10
9146471	Resist stripping compositions and methods for manufacturing electrical devices	—	2015-09-29
9005367	Resist stripping compositions and methods for manufacturing electrical devices	—	2015-04-14
8969275	Aqueous alkaline cleaning compositions and methods of their use	Raimund Mellies	2015-03-03
8927476	Aqueous alkaline cleaning compositions and methods of their use	Raimund Mellies	2015-01-06
8901000	Aqueous acidic solution and etching solution and method for texturizing the surface of single crystal and polycrystal silicon substrates	Simon Braun, Cornelia Roeger-Goepfert, Christian Bittner, MeiChin Shen, Chengwei Lin	2014-12-02

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Andreas Klipp — 28 Patents

Issued Patents All Time

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