Issued Patents All Time
Showing 25 most recent of 28 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12331239 | Composition and process for selectively etching a layer comprising an aluminium compound in the presence of layers of low-k materials, copper and/or cobalt | Joannes Theodorus Valentinus Hoogboom, Jhih Jheng Ke, Che Wei Wang, Yi-Ping Cheng | 2025-06-17 |
| 12084628 | Composition comprising a primary and a secondary surfactant, for cleaning or rinsing a product | I Chen Chou, Berthold Ferstl | 2024-09-10 |
| 12024693 | Imidazolidinethione-containing compositions for post-ash residue removal and/or for oxidative etching of a layer or mask comprising TiN | Joannes Theodorus Valentinus Hoogboom, Jhih Jheng Ke, Yi-Ping Cheng | 2024-07-02 |
| 11742197 | Cleavable additives for use in a method of making a semiconductor substrate | Christian Bittner, Simon Braun, Guenter Oetter, Yeni Burk | 2023-08-29 |
| 11377624 | Cleaning composition for post-etch or post ash residue removal from a semiconductor substrate and corresponding manufacturing process | Jhih Jheng Ke, Yi-Ping Cheng, Joannes Theodorus Valentinus Hoogboom | 2022-07-05 |
| 11180719 | Use of compositions comprising a siloxane-type additive for avoiding pattern collapse when treating patterned materials with line-space dimensions of 50 nm or below | Daniel LOEFFLER, Mei Chin SHEN, Sheng-Hsuan Wei, Frank Oliver Heinrich Pirrung, Lothar Alexander Engelbrecht +3 more | 2021-11-23 |
| 11168239 | Chemical-mechanical polishing composition comprising benzotriazole derivatives as corrosion inhibitors | Robert REICHARDT, Martin Kaller, Michael Lauter, Yuzhuo Li | 2021-11-09 |
| 10865361 | Composition for post chemical-mechanical-polishing cleaning | Christian Daeschlein, Max Siebert, Michael Lauter, Leonardus Leunissen, Ivan Garcia Romero +3 more | 2020-12-15 |
| 10844325 | Composition for post chemical-mechanical-polishing cleaning | Christian Daeschlein, Max Siebert, Michael Lauter, Peter Przybylski, Julian Proelss +4 more | 2020-11-24 |
| 10844333 | Composition for post chemical-mechanical-polishing cleaning | Christian Daeschlein, Max Siebert, Michael Lauter, Piotr Przybylski, Julian Proelss +4 more | 2020-11-24 |
| 10647900 | Chemical-mechanical polishing composition comprising benzotriazole derivatives as corrosion inhibitors | Robert REICHARDT, Martin Kaller, Michael Lauter, Yuzhuo Li | 2020-05-12 |
| 10538724 | Defect reduction rinse solution containing ammonium salts of sulfoesters | Christian Bittner, Guenter Oetter, Andrei Honciuc, Simon Braun | 2020-01-21 |
| 10385295 | Compositions for anti pattern collapse treatment comprising gemini additives | Andrei Honciuc, Guenter Oetter, Christian Bittner | 2019-08-20 |
| 9891520 | Use of surfactants having at least three short-chain perfluorinated groups in formulations for photo mask cleaning | Andrei Honciuc, Chu-Ya Yang | 2018-02-13 |
| 9557652 | Use of compositions comprising a surfactant and a hydrophobizer for avoiding anti pattern collapse when treating patterned materials with line-space dimensions of 50 nm or below | Andrei Honciuc, Günter Oetter, Christian Bittner | 2017-01-31 |
| 9484218 | Post ion implant stripper for advanced semiconductor application | ChienShin Chen, MeiChin Shen, ChiaHao Chan | 2016-11-01 |
| 9275851 | Aqueous, nitrogen-free cleaning composition and its use for removing residues and contaminants from semiconductor substrates suitable for manufacturing microelectronic devices | Vijay Immanuel Raman, Shyam Sundar Venkataraman, Raimund Mellies, Mingjie Zhong | 2016-03-01 |
| 9236256 | Use of surfactants having at least three short-chain perfluorinated groups RF for manufacturing integrated circuits having patterns with line-space dimensions below 50 NM | Dieter Mayer | 2016-01-12 |
| 9223221 | Photoresist stripping and cleaning composition, method of its preparation and its use | Simon Braun, Christian Bittner | 2015-12-29 |
| 9184057 | Method for manufacturing integrated circuit devices, optical devices, micromachines and mechanical precision devices having patterned material layers with line-space dimensions of 50 nm and less | Guenter Oetter, Sabrina Montero Pancera, Andrei Honciuc, Christian Bittner | 2015-11-10 |
| 9146471 | Resist stripping compositions and methods for manufacturing electrical devices | — | 2015-09-29 |
| 9005367 | Resist stripping compositions and methods for manufacturing electrical devices | — | 2015-04-14 |
| 8969275 | Aqueous alkaline cleaning compositions and methods of their use | Raimund Mellies | 2015-03-03 |
| 8927476 | Aqueous alkaline cleaning compositions and methods of their use | Raimund Mellies | 2015-01-06 |
| 8901000 | Aqueous acidic solution and etching solution and method for texturizing the surface of single crystal and polycrystal silicon substrates | Simon Braun, Cornelia Roeger-Goepfert, Christian Bittner, MeiChin Shen, Chengwei Lin | 2014-12-02 |