| 12351737 |
Chemical mechanical polishing of substrates containing copper and ruthenium |
Haci Osman GUEVENC, Michael Lauter, Te Yu Wei, Wei-Lan Chiu, Reza Golzarian +1 more |
2025-07-08 |
| 11993729 |
Chemical mechanical polishing composition |
Christian Daeschlein, Max Siebert, Yongqing Lan, Michael Lauter, Sheik Ansar Usman Ibrahim +4 more |
2024-05-28 |
| 11725117 |
Chemical mechanical polishing of substrates containing copper and ruthenium |
Haci Osman GUEVENC, Michael Lauter, Te Yu Wei, Wei-Lan Chiu, Reza Golzarian +1 more |
2023-08-15 |
| 11286402 |
Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt and / or cobalt alloy comprising substrates |
Robert REICHARDT, Max Siebert, Yongqing Lan, Michael Lauter, Sheik Ansar Usman Ibrahim +3 more |
2022-03-29 |
| 11264250 |
Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt and / or cobalt alloy comprising substrates |
Robert REICHARDT, Max Siebert, Yongqing Lan, Michael Lauter, Sheik Ansar Usman Ibrahim +3 more |
2022-03-01 |
| 10899945 |
Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt comprising substrates |
Robert REICHARDT, Max Siebert, Yongqing Lan, Michael Lauter, Sheik Ansar Usman Ibrahim +4 more |
2021-01-26 |
| 10865361 |
Composition for post chemical-mechanical-polishing cleaning |
Christian Daeschlein, Max Siebert, Michael Lauter, Leonardus Leunissen, Ivan Garcia Romero +3 more |
2020-12-15 |
| 10844333 |
Composition for post chemical-mechanical-polishing cleaning |
Christian Daeschlein, Max Siebert, Michael Lauter, Piotr Przybylski, Andreas Klipp +4 more |
2020-11-24 |
| 10844325 |
Composition for post chemical-mechanical-polishing cleaning |
Christian Daeschlein, Max Siebert, Michael Lauter, Peter Przybylski, Andreas Klipp +4 more |
2020-11-24 |
| 10738219 |
Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt and / or cobalt alloy comprising substrates |
Robert REICHARDT, Max Siebert, Yongqing Lan, Michael Lauter, Sheik Ansar Usman Ibrahim +3 more |
2020-08-11 |
| 10570316 |
Chemical mechanical polishing (CMP) composition |
Robert REICHARDT, Max Siebert, Yongqing Lan, Michael Lauter, Haci Osman GUEVENC +2 more |
2020-02-25 |
| 10385236 |
Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt and / or cobalt alloy comprising substrates |
Robert REICHARDT, Max Siebert, Yongqing Lan, Michael Lauter, Sheik Ansar Usman Ibrahim +3 more |
2019-08-20 |
| 10090159 |
Chemical-mechanical polishing compositions comprising one or more polymers selected from the group consisting of N-vinyl-homopolymers and N-vinyl copolymers |
Yongqing Lan, Peter Przybylski, Zhenyu Bao |
2018-10-02 |
| 9862862 |
Chemical-mechanical polishing compositions comprising polyethylene imine |
Yongqing Lan, Peter Przybylski, Zhenyu Bao |
2018-01-09 |
| 9828527 |
Chemical-mechanical polishing compositions comprising N,N,N′,N′-tetrakis-(2-hydroxypropyl)-ethylenediamine or methanesulfonic acid |
Yongqing Lan, Peter Przybylski, Zhenyu Bao |
2017-11-28 |
| 9765239 |
Use of a chemical-mechanical polishing (CMP) composition for polishing a substrate or layer containing at least one III-V material |
Yongqing Lan, Peter Przybylski, Zhenyu Bao |
2017-09-19 |
| 8969276 |
Aqueous acidic etching solution and method for texturing the surface of single crystal and polycrystal silicon substrates |
Simon Braun, Ihor Melnyk, Michael Michel, Stefan Mathijssen |
2015-03-03 |
| 8119097 |
Method for producing nanoparticulate solid materials |
Frank Kleine Jäger |
2012-02-21 |
