Issued Patents All Time
Showing 1–18 of 18 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12351737 | Chemical mechanical polishing of substrates containing copper and ruthenium | Haci Osman GUEVENC, Michael Lauter, Te Yu Wei, Wei-Lan Chiu, Reza Golzarian +1 more | 2025-07-08 |
| 11993729 | Chemical mechanical polishing composition | Christian Daeschlein, Max Siebert, Yongqing Lan, Michael Lauter, Sheik Ansar Usman Ibrahim +4 more | 2024-05-28 |
| 11725117 | Chemical mechanical polishing of substrates containing copper and ruthenium | Haci Osman GUEVENC, Michael Lauter, Te Yu Wei, Wei-Lan Chiu, Reza Golzarian +1 more | 2023-08-15 |
| 11286402 | Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt and / or cobalt alloy comprising substrates | Robert REICHARDT, Max Siebert, Yongqing Lan, Michael Lauter, Sheik Ansar Usman Ibrahim +3 more | 2022-03-29 |
| 11264250 | Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt and / or cobalt alloy comprising substrates | Robert REICHARDT, Max Siebert, Yongqing Lan, Michael Lauter, Sheik Ansar Usman Ibrahim +3 more | 2022-03-01 |
| 10899945 | Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt comprising substrates | Robert REICHARDT, Max Siebert, Yongqing Lan, Michael Lauter, Sheik Ansar Usman Ibrahim +4 more | 2021-01-26 |
| 10865361 | Composition for post chemical-mechanical-polishing cleaning | Christian Daeschlein, Max Siebert, Michael Lauter, Leonardus Leunissen, Ivan Garcia Romero +3 more | 2020-12-15 |
| 10844333 | Composition for post chemical-mechanical-polishing cleaning | Christian Daeschlein, Max Siebert, Michael Lauter, Piotr Przybylski, Andreas Klipp +4 more | 2020-11-24 |
| 10844325 | Composition for post chemical-mechanical-polishing cleaning | Christian Daeschlein, Max Siebert, Michael Lauter, Peter Przybylski, Andreas Klipp +4 more | 2020-11-24 |
| 10738219 | Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt and / or cobalt alloy comprising substrates | Robert REICHARDT, Max Siebert, Yongqing Lan, Michael Lauter, Sheik Ansar Usman Ibrahim +3 more | 2020-08-11 |
| 10570316 | Chemical mechanical polishing (CMP) composition | Robert REICHARDT, Max Siebert, Yongqing Lan, Michael Lauter, Haci Osman GUEVENC +2 more | 2020-02-25 |
| 10385236 | Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt and / or cobalt alloy comprising substrates | Robert REICHARDT, Max Siebert, Yongqing Lan, Michael Lauter, Sheik Ansar Usman Ibrahim +3 more | 2019-08-20 |
| 10090159 | Chemical-mechanical polishing compositions comprising one or more polymers selected from the group consisting of N-vinyl-homopolymers and N-vinyl copolymers | Yongqing Lan, Peter Przybylski, Zhenyu Bao | 2018-10-02 |
| 9862862 | Chemical-mechanical polishing compositions comprising polyethylene imine | Yongqing Lan, Peter Przybylski, Zhenyu Bao | 2018-01-09 |
| 9828527 | Chemical-mechanical polishing compositions comprising N,N,N′,N′-tetrakis-(2-hydroxypropyl)-ethylenediamine or methanesulfonic acid | Yongqing Lan, Peter Przybylski, Zhenyu Bao | 2017-11-28 |
| 9765239 | Use of a chemical-mechanical polishing (CMP) composition for polishing a substrate or layer containing at least one III-V material | Yongqing Lan, Peter Przybylski, Zhenyu Bao | 2017-09-19 |
| 8969276 | Aqueous acidic etching solution and method for texturing the surface of single crystal and polycrystal silicon substrates | Simon Braun, Ihor Melnyk, Michael Michel, Stefan Mathijssen | 2015-03-03 |
| 8119097 | Method for producing nanoparticulate solid materials | Frank Kleine Jäger | 2012-02-21 |