| 12378439 |
Compositions for tungsten etching inhibition |
Michael Lauter, Wei-Lan Chiu, Te Yu Wei |
2025-08-05 |
| 12351737 |
Chemical mechanical polishing of substrates containing copper and ruthenium |
Michael Lauter, Te Yu Wei, Wei-Lan Chiu, Reza Golzarian, Julian Proelss +1 more |
2025-07-08 |
| 11993729 |
Chemical mechanical polishing composition |
Christian Daeschlein, Max Siebert, Yongqing Lan, Michael Lauter, Sheik Ansar Usman Ibrahim +4 more |
2024-05-28 |
| 11725117 |
Chemical mechanical polishing of substrates containing copper and ruthenium |
Michael Lauter, Te Yu Wei, Wei-Lan Chiu, Reza Golzarian, Julian Proelss +1 more |
2023-08-15 |
| 11286402 |
Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt and / or cobalt alloy comprising substrates |
Robert REICHARDT, Max Siebert, Yongqing Lan, Michael Lauter, Sheik Ansar Usman Ibrahim +3 more |
2022-03-29 |
| 11264250 |
Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt and / or cobalt alloy comprising substrates |
Robert REICHARDT, Max Siebert, Yongqing Lan, Michael Lauter, Sheik Ansar Usman Ibrahim +3 more |
2022-03-01 |
| 10899945 |
Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt comprising substrates |
Robert REICHARDT, Max Siebert, Yongqing Lan, Michael Lauter, Sheik Ansar Usman Ibrahim +4 more |
2021-01-26 |
| 10865361 |
Composition for post chemical-mechanical-polishing cleaning |
Christian Daeschlein, Max Siebert, Michael Lauter, Leonardus Leunissen, Ivan Garcia Romero +3 more |
2020-12-15 |
| 10844325 |
Composition for post chemical-mechanical-polishing cleaning |
Christian Daeschlein, Max Siebert, Michael Lauter, Peter Przybylski, Julian Proelss +4 more |
2020-11-24 |
| 10844333 |
Composition for post chemical-mechanical-polishing cleaning |
Christian Daeschlein, Max Siebert, Michael Lauter, Piotr Przybylski, Julian Proelss +4 more |
2020-11-24 |
| 10738219 |
Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt and / or cobalt alloy comprising substrates |
Robert REICHARDT, Max Siebert, Yongqing Lan, Michael Lauter, Sheik Ansar Usman Ibrahim +3 more |
2020-08-11 |
| 10570316 |
Chemical mechanical polishing (CMP) composition |
Robert REICHARDT, Max Siebert, Yongqing Lan, Michael Lauter, Julian Proelss +2 more |
2020-02-25 |
| 10385236 |
Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt and / or cobalt alloy comprising substrates |
Robert REICHARDT, Max Siebert, Yongqing Lan, Michael Lauter, Sheik Ansar Usman Ibrahim +3 more |
2019-08-20 |
