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Chemical mechanical polishing composition |
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| 11286402 |
Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt and / or cobalt alloy comprising substrates |
Robert REICHARDT, Max Siebert, Yongqing Lan, Michael Lauter, Reza Golzarian +3 more |
2022-03-29 |
| 11264250 |
Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt and / or cobalt alloy comprising substrates |
Robert REICHARDT, Max Siebert, Yongqing Lan, Michael Lauter, Reza Golzarian +3 more |
2022-03-01 |
| 10899945 |
Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt comprising substrates |
Robert REICHARDT, Max Siebert, Yongqing Lan, Michael Lauter, Reza Golzarian +4 more |
2021-01-26 |
| 10738219 |
Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt and / or cobalt alloy comprising substrates |
Robert REICHARDT, Max Siebert, Yongqing Lan, Michael Lauter, Reza Golzarian +3 more |
2020-08-11 |
| 10570316 |
Chemical mechanical polishing (CMP) composition |
Robert REICHARDT, Max Siebert, Yongqing Lan, Michael Lauter, Haci Osman GUEVENC +2 more |
2020-02-25 |
| 10385236 |
Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt and / or cobalt alloy comprising substrates |
Robert REICHARDT, Max Siebert, Yongqing Lan, Michael Lauter, Reza Golzarian +3 more |
2019-08-20 |
| 10227506 |
Chemical mechanical polishing (CMP) composition for high effective polishing of substrates comprising germanium |
Max Siebert, Michael Lauter, Yongqing Lan, Robert REICHARDT, Alexandra Muench +4 more |
2019-03-12 |
| 9487675 |
Chemical mechanical polishing composition comprising polyvinyl phosphonic acid and its derivatives |
Vijay Immanuel Raman, Yuzhuo Li, Christian Schade, Shyam Sundar Venkataraman, Eason Yu-Shen Su |
2016-11-08 |