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Chemical mechanical polishing composition |
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Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt and / or cobalt alloy comprising substrates |
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Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt and / or cobalt alloy comprising substrates |
Robert REICHARDT, Max Siebert, Michael Lauter, Sheik Ansar Usman Ibrahim, Reza Golzarian +3 more |
2022-03-01 |
| 10899945 |
Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt comprising substrates |
Robert REICHARDT, Max Siebert, Michael Lauter, Sheik Ansar Usman Ibrahim, Reza Golzarian +4 more |
2021-01-26 |
| 10738219 |
Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt and / or cobalt alloy comprising substrates |
Robert REICHARDT, Max Siebert, Michael Lauter, Sheik Ansar Usman Ibrahim, Reza Golzarian +3 more |
2020-08-11 |
| 10570316 |
Chemical mechanical polishing (CMP) composition |
Robert REICHARDT, Max Siebert, Michael Lauter, Haci Osman GUEVENC, Julian Proelss +2 more |
2020-02-25 |
| 10407594 |
Chemical mechanical polishing (CMP) composition comprising a polymeric polyamine |
Bastian Marten Noller, Yuzhuo Li, Diana Franz, Kenneth Rushing, Michael Lauter +2 more |
2019-09-10 |
| 10392531 |
Process for removing a bulk material layer from a substrate and a chemical mechanical polishing agent suitable for this process |
Vijay Immanuel Raman, Sophia Ebert, Mario Brands, Philipp Zacharias, Ilshat Gubaydullin +1 more |
2019-08-27 |
| 10385236 |
Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt and / or cobalt alloy comprising substrates |
Robert REICHARDT, Max Siebert, Michael Lauter, Sheik Ansar Usman Ibrahim, Reza Golzarian +3 more |
2019-08-20 |
| 10227506 |
Chemical mechanical polishing (CMP) composition for high effective polishing of substrates comprising germanium |
Max Siebert, Michael Lauter, Robert REICHARDT, Alexandra Muench, Manuel SIX +4 more |
2019-03-12 |
| 10214663 |
Chemical-mechanical polishing composition comprising organic/inorganic composite particles |
Bastian Marten Noller, Yuzhuo Li, Liang Jiang, Daniel Kwo-Hung Shen, Reza Golzarian |
2019-02-26 |
| 10090159 |
Chemical-mechanical polishing compositions comprising one or more polymers selected from the group consisting of N-vinyl-homopolymers and N-vinyl copolymers |
Peter Przybylski, Zhenyu Bao, Julian Proelss |
2018-10-02 |
| 9862862 |
Chemical-mechanical polishing compositions comprising polyethylene imine |
Peter Przybylski, Zhenyu Bao, Julian Proelss |
2018-01-09 |
| 9828527 |
Chemical-mechanical polishing compositions comprising N,N,N′,N′-tetrakis-(2-hydroxypropyl)-ethylenediamine or methanesulfonic acid |
Peter Przybylski, Zhenyu Bao, Julian Proelss |
2017-11-28 |
| 9765239 |
Use of a chemical-mechanical polishing (CMP) composition for polishing a substrate or layer containing at least one III-V material |
Peter Przybylski, Zhenyu Bao, Julian Proelss |
2017-09-19 |
| 9028708 |
Process for removing a bulk material layer from a substrate and a chemical mechanical polishing agent suitable for this process |
Vijay Immanuel Raman, Yuzhuo Li, Mario Brands, Kenneth Rushing, Karpagavalli Ramji |
2015-05-12 |
| 8747687 |
Aqueous polishing agent comprising solid polymer particles and two complexing agents and its use in a process for polishing patterned and unstructured metal surfaces |
Vijay Immanuel Raman, Ilshat Gubaydullin, Yuzhuo Li, Mario Brands |
2014-06-10 |
| 8679980 |
Aqueous metal polishing agent comprising a polymeric abrasiv containing pendant functional groups and its use in a CMP process |
Vijay Immanuel Raman, Ilshat Gubaydullin, Yuzhuo Li, Mario Brands |
2014-03-25 |
