Issued Patents All Time
Showing 1–18 of 18 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11993729 | Chemical mechanical polishing composition | Christian Daeschlein, Max Siebert, Michael Lauter, Sheik Ansar Usman Ibrahim, Reza Golzarian +4 more | 2024-05-28 |
| 11286402 | Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt and / or cobalt alloy comprising substrates | Robert REICHARDT, Max Siebert, Michael Lauter, Sheik Ansar Usman Ibrahim, Reza Golzarian +3 more | 2022-03-29 |
| 11264250 | Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt and / or cobalt alloy comprising substrates | Robert REICHARDT, Max Siebert, Michael Lauter, Sheik Ansar Usman Ibrahim, Reza Golzarian +3 more | 2022-03-01 |
| 10899945 | Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt comprising substrates | Robert REICHARDT, Max Siebert, Michael Lauter, Sheik Ansar Usman Ibrahim, Reza Golzarian +4 more | 2021-01-26 |
| 10738219 | Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt and / or cobalt alloy comprising substrates | Robert REICHARDT, Max Siebert, Michael Lauter, Sheik Ansar Usman Ibrahim, Reza Golzarian +3 more | 2020-08-11 |
| 10570316 | Chemical mechanical polishing (CMP) composition | Robert REICHARDT, Max Siebert, Michael Lauter, Haci Osman GUEVENC, Julian Proelss +2 more | 2020-02-25 |
| 10407594 | Chemical mechanical polishing (CMP) composition comprising a polymeric polyamine | Bastian Marten Noller, Yuzhuo Li, Diana Franz, Kenneth Rushing, Michael Lauter +2 more | 2019-09-10 |
| 10392531 | Process for removing a bulk material layer from a substrate and a chemical mechanical polishing agent suitable for this process | Vijay Immanuel Raman, Sophia Ebert, Mario Brands, Philipp Zacharias, Ilshat Gubaydullin +1 more | 2019-08-27 |
| 10385236 | Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt and / or cobalt alloy comprising substrates | Robert REICHARDT, Max Siebert, Michael Lauter, Sheik Ansar Usman Ibrahim, Reza Golzarian +3 more | 2019-08-20 |
| 10227506 | Chemical mechanical polishing (CMP) composition for high effective polishing of substrates comprising germanium | Max Siebert, Michael Lauter, Robert REICHARDT, Alexandra Muench, Manuel SIX +4 more | 2019-03-12 |
| 10214663 | Chemical-mechanical polishing composition comprising organic/inorganic composite particles | Bastian Marten Noller, Yuzhuo Li, Liang Jiang, Daniel Kwo-Hung Shen, Reza Golzarian | 2019-02-26 |
| 10090159 | Chemical-mechanical polishing compositions comprising one or more polymers selected from the group consisting of N-vinyl-homopolymers and N-vinyl copolymers | Peter Przybylski, Zhenyu Bao, Julian Proelss | 2018-10-02 |
| 9862862 | Chemical-mechanical polishing compositions comprising polyethylene imine | Peter Przybylski, Zhenyu Bao, Julian Proelss | 2018-01-09 |
| 9828527 | Chemical-mechanical polishing compositions comprising N,N,N′,N′-tetrakis-(2-hydroxypropyl)-ethylenediamine or methanesulfonic acid | Peter Przybylski, Zhenyu Bao, Julian Proelss | 2017-11-28 |
| 9765239 | Use of a chemical-mechanical polishing (CMP) composition for polishing a substrate or layer containing at least one III-V material | Peter Przybylski, Zhenyu Bao, Julian Proelss | 2017-09-19 |
| 9028708 | Process for removing a bulk material layer from a substrate and a chemical mechanical polishing agent suitable for this process | Vijay Immanuel Raman, Yuzhuo Li, Mario Brands, Kenneth Rushing, Karpagavalli Ramji | 2015-05-12 |
| 8747687 | Aqueous polishing agent comprising solid polymer particles and two complexing agents and its use in a process for polishing patterned and unstructured metal surfaces | Vijay Immanuel Raman, Ilshat Gubaydullin, Yuzhuo Li, Mario Brands | 2014-06-10 |
| 8679980 | Aqueous metal polishing agent comprising a polymeric abrasiv containing pendant functional groups and its use in a CMP process | Vijay Immanuel Raman, Ilshat Gubaydullin, Yuzhuo Li, Mario Brands | 2014-03-25 |