Issued Patents All Time
Showing 1–5 of 5 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10407594 | Chemical mechanical polishing (CMP) composition comprising a polymeric polyamine | Bastian Marten Noller, Yuzhuo Li, Diana Franz, Kenneth Rushing, Michael Lauter +2 more | 2019-09-10 |
| 10090159 | Chemical-mechanical polishing compositions comprising one or more polymers selected from the group consisting of N-vinyl-homopolymers and N-vinyl copolymers | Yongqing Lan, Peter Przybylski, Julian Proelss | 2018-10-02 |
| 9862862 | Chemical-mechanical polishing compositions comprising polyethylene imine | Yongqing Lan, Peter Przybylski, Julian Proelss | 2018-01-09 |
| 9828527 | Chemical-mechanical polishing compositions comprising N,N,N′,N′-tetrakis-(2-hydroxypropyl)-ethylenediamine or methanesulfonic acid | Yongqing Lan, Peter Przybylski, Julian Proelss | 2017-11-28 |
| 9765239 | Use of a chemical-mechanical polishing (CMP) composition for polishing a substrate or layer containing at least one III-V material | Yongqing Lan, Peter Przybylski, Julian Proelss | 2017-09-19 |