| 10865361 |
Composition for post chemical-mechanical-polishing cleaning |
Christian Daeschlein, Max Siebert, Michael Lauter, Leonardus Leunissen, Ivan Garcia Romero +3 more |
2020-12-15 |
| 10844325 |
Composition for post chemical-mechanical-polishing cleaning |
Christian Daeschlein, Max Siebert, Michael Lauter, Julian Proelss, Andreas Klipp +4 more |
2020-11-24 |
| 10090159 |
Chemical-mechanical polishing compositions comprising one or more polymers selected from the group consisting of N-vinyl-homopolymers and N-vinyl copolymers |
Yongqing Lan, Zhenyu Bao, Julian Proelss |
2018-10-02 |
| 9862862 |
Chemical-mechanical polishing compositions comprising polyethylene imine |
Yongqing Lan, Zhenyu Bao, Julian Proelss |
2018-01-09 |
| 9828527 |
Chemical-mechanical polishing compositions comprising N,N,N′,N′-tetrakis-(2-hydroxypropyl)-ethylenediamine or methanesulfonic acid |
Yongqing Lan, Zhenyu Bao, Julian Proelss |
2017-11-28 |
| 9765239 |
Use of a chemical-mechanical polishing (CMP) composition for polishing a substrate or layer containing at least one III-V material |
Yongqing Lan, Zhenyu Bao, Julian Proelss |
2017-09-19 |
