Issued Patents All Time
Showing 1–6 of 6 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10865361 | Composition for post chemical-mechanical-polishing cleaning | Christian Daeschlein, Max Siebert, Michael Lauter, Leonardus Leunissen, Ivan Garcia Romero +3 more | 2020-12-15 |
| 10844325 | Composition for post chemical-mechanical-polishing cleaning | Christian Daeschlein, Max Siebert, Michael Lauter, Julian Proelss, Andreas Klipp +4 more | 2020-11-24 |
| 10090159 | Chemical-mechanical polishing compositions comprising one or more polymers selected from the group consisting of N-vinyl-homopolymers and N-vinyl copolymers | Yongqing Lan, Zhenyu Bao, Julian Proelss | 2018-10-02 |
| 9862862 | Chemical-mechanical polishing compositions comprising polyethylene imine | Yongqing Lan, Zhenyu Bao, Julian Proelss | 2018-01-09 |
| 9828527 | Chemical-mechanical polishing compositions comprising N,N,N′,N′-tetrakis-(2-hydroxypropyl)-ethylenediamine or methanesulfonic acid | Yongqing Lan, Zhenyu Bao, Julian Proelss | 2017-11-28 |
| 9765239 | Use of a chemical-mechanical polishing (CMP) composition for polishing a substrate or layer containing at least one III-V material | Yongqing Lan, Zhenyu Bao, Julian Proelss | 2017-09-19 |