Issued Patents All Time
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10407594 | Chemical mechanical polishing (CMP) composition comprising a polymeric polyamine | Bastian Marten Noller, Yuzhuo Li, Diana Franz, Kenneth Rushing, Michael Lauter +2 more | 2019-09-10 |
| 10214663 | Chemical-mechanical polishing composition comprising organic/inorganic composite particles | Yongqing Lan, Bastian Marten Noller, Yuzhuo Li, Liang Jiang, Reza Golzarian | 2019-02-26 |
| 9496146 | Method for forming through-base wafer vias | Yuzhuo Li, Changxue Wang | 2016-11-15 |
| 9255214 | Chemical mechanical polishing (CMP) composition comprising inorganic particles and polymer particles | Michael Lauter, Vijay Immanuel Raman, Yuzhuo Li, Shyam Sundar Venkataraman | 2016-02-09 |