Issued Patents All Time
Showing 1–14 of 14 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11713369 | Polymeric additives for reducing the viscosity loss on tinting | Matthias MAIER, Tim Meisenzahl | 2023-08-01 |
| 11286402 | Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt and / or cobalt alloy comprising substrates | Max Siebert, Yongqing Lan, Michael Lauter, Sheik Ansar Usman Ibrahim, Reza Golzarian +3 more | 2022-03-29 |
| 11264250 | Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt and / or cobalt alloy comprising substrates | Max Siebert, Yongqing Lan, Michael Lauter, Sheik Ansar Usman Ibrahim, Reza Golzarian +3 more | 2022-03-01 |
| 11168239 | Chemical-mechanical polishing composition comprising benzotriazole derivatives as corrosion inhibitors | Martin Kaller, Michael Lauter, Yuzhuo Li, Andreas Klipp | 2021-11-09 |
| 10899945 | Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt comprising substrates | Max Siebert, Yongqing Lan, Michael Lauter, Sheik Ansar Usman Ibrahim, Reza Golzarian +4 more | 2021-01-26 |
| 10738219 | Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt and / or cobalt alloy comprising substrates | Max Siebert, Yongqing Lan, Michael Lauter, Sheik Ansar Usman Ibrahim, Reza Golzarian +3 more | 2020-08-11 |
| 10647900 | Chemical-mechanical polishing composition comprising benzotriazole derivatives as corrosion inhibitors | Martin Kaller, Michael Lauter, Yuzhuo Li, Andreas Klipp | 2020-05-12 |
| 10570316 | Chemical mechanical polishing (CMP) composition | Max Siebert, Yongqing Lan, Michael Lauter, Haci Osman GUEVENC, Julian Proelss +2 more | 2020-02-25 |
| 10385236 | Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt and / or cobalt alloy comprising substrates | Max Siebert, Yongqing Lan, Michael Lauter, Sheik Ansar Usman Ibrahim, Reza Golzarian +3 more | 2019-08-20 |
| 10227506 | Chemical mechanical polishing (CMP) composition for high effective polishing of substrates comprising germanium | Max Siebert, Michael Lauter, Yongqing Lan, Alexandra Muench, Manuel SIX +4 more | 2019-03-12 |
| 8980750 | Chemical mechanical polishing (CMP) composition comprising a non-ionic surfactant and a carbonate salt | Yuzhuo Li, Michael Lauter, Wei-Lan Chiu | 2015-03-17 |
| D572467 | Utility holding device | — | 2008-07-08 |
| D498048 | Utility holster | — | 2004-11-09 |
| D428250 | Tool pouch | — | 2000-07-18 |