RR

Robert REICHARDT

Basf Se: 11 patents #1,483 of 13,826Top 15%
Overall (All Time): #342,108 of 4,157,543Top 9%
14
Patents All Time

Issued Patents All Time

Patent #TitleCo-InventorsDate
11713369 Polymeric additives for reducing the viscosity loss on tinting Matthias MAIER, Tim Meisenzahl 2023-08-01
11286402 Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt and / or cobalt alloy comprising substrates Max Siebert, Yongqing Lan, Michael Lauter, Sheik Ansar Usman Ibrahim, Reza Golzarian +3 more 2022-03-29
11264250 Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt and / or cobalt alloy comprising substrates Max Siebert, Yongqing Lan, Michael Lauter, Sheik Ansar Usman Ibrahim, Reza Golzarian +3 more 2022-03-01
11168239 Chemical-mechanical polishing composition comprising benzotriazole derivatives as corrosion inhibitors Martin Kaller, Michael Lauter, Yuzhuo Li, Andreas Klipp 2021-11-09
10899945 Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt comprising substrates Max Siebert, Yongqing Lan, Michael Lauter, Sheik Ansar Usman Ibrahim, Reza Golzarian +4 more 2021-01-26
10738219 Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt and / or cobalt alloy comprising substrates Max Siebert, Yongqing Lan, Michael Lauter, Sheik Ansar Usman Ibrahim, Reza Golzarian +3 more 2020-08-11
10647900 Chemical-mechanical polishing composition comprising benzotriazole derivatives as corrosion inhibitors Martin Kaller, Michael Lauter, Yuzhuo Li, Andreas Klipp 2020-05-12
10570316 Chemical mechanical polishing (CMP) composition Max Siebert, Yongqing Lan, Michael Lauter, Haci Osman GUEVENC, Julian Proelss +2 more 2020-02-25
10385236 Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt and / or cobalt alloy comprising substrates Max Siebert, Yongqing Lan, Michael Lauter, Sheik Ansar Usman Ibrahim, Reza Golzarian +3 more 2019-08-20
10227506 Chemical mechanical polishing (CMP) composition for high effective polishing of substrates comprising germanium Max Siebert, Michael Lauter, Yongqing Lan, Alexandra Muench, Manuel SIX +4 more 2019-03-12
8980750 Chemical mechanical polishing (CMP) composition comprising a non-ionic surfactant and a carbonate salt Yuzhuo Li, Michael Lauter, Wei-Lan Chiu 2015-03-17
D572467 Utility holding device 2008-07-08
D498048 Utility holster 2004-11-09
D428250 Tool pouch 2000-07-18