| 11713369 |
Polymeric additives for reducing the viscosity loss on tinting |
Matthias MAIER, Tim Meisenzahl |
2023-08-01 |
| 11286402 |
Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt and / or cobalt alloy comprising substrates |
Max Siebert, Yongqing Lan, Michael Lauter, Sheik Ansar Usman Ibrahim, Reza Golzarian +3 more |
2022-03-29 |
| 11264250 |
Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt and / or cobalt alloy comprising substrates |
Max Siebert, Yongqing Lan, Michael Lauter, Sheik Ansar Usman Ibrahim, Reza Golzarian +3 more |
2022-03-01 |
| 11168239 |
Chemical-mechanical polishing composition comprising benzotriazole derivatives as corrosion inhibitors |
Martin Kaller, Michael Lauter, Yuzhuo Li, Andreas Klipp |
2021-11-09 |
| 10899945 |
Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt comprising substrates |
Max Siebert, Yongqing Lan, Michael Lauter, Sheik Ansar Usman Ibrahim, Reza Golzarian +4 more |
2021-01-26 |
| 10738219 |
Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt and / or cobalt alloy comprising substrates |
Max Siebert, Yongqing Lan, Michael Lauter, Sheik Ansar Usman Ibrahim, Reza Golzarian +3 more |
2020-08-11 |
| 10647900 |
Chemical-mechanical polishing composition comprising benzotriazole derivatives as corrosion inhibitors |
Martin Kaller, Michael Lauter, Yuzhuo Li, Andreas Klipp |
2020-05-12 |
| 10570316 |
Chemical mechanical polishing (CMP) composition |
Max Siebert, Yongqing Lan, Michael Lauter, Haci Osman GUEVENC, Julian Proelss +2 more |
2020-02-25 |
| 10385236 |
Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt and / or cobalt alloy comprising substrates |
Max Siebert, Yongqing Lan, Michael Lauter, Sheik Ansar Usman Ibrahim, Reza Golzarian +3 more |
2019-08-20 |
| 10227506 |
Chemical mechanical polishing (CMP) composition for high effective polishing of substrates comprising germanium |
Max Siebert, Michael Lauter, Yongqing Lan, Alexandra Muench, Manuel SIX +4 more |
2019-03-12 |
| 8980750 |
Chemical mechanical polishing (CMP) composition comprising a non-ionic surfactant and a carbonate salt |
Yuzhuo Li, Michael Lauter, Wei-Lan Chiu |
2015-03-17 |
| D572467 |
Utility holding device |
— |
2008-07-08 |
| D498048 |
Utility holster |
— |
2004-11-09 |
| D428250 |
Tool pouch |
— |
2000-07-18 |