Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Chemical mechanical polishing (CMP) composition comprising a polymeric polyamine

Chemical mechanical polishing (CMP) composition comprising a polymeric polyamine

US Patent 10407594 · Granted Sep 10, 2019

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Microcapsules comprising cinmethyln in the core and a polyurea derived from diph2025
Compositions for tungsten etching inhibition2025
Chemical mechanical polishing of substrates containing copper and ruthenium2025
Chemical mechanical polishing composition2024
Chemical mechanical polishing composition2024
Woody rootstock for efficient grafting of solanaceous vegetables and efficient g2023
Chemical mechanical polishing of substrates containing copper and ruthenium2023
Microparticle compositions comprising saflufenacil2022
Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt2022
Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt2022
Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt2022
Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt2022