DC

Daniel Carl

Applied Materials: 22 patents #582 of 7,310Top 8%
IBM: 4 patents #21,733 of 70,183Top 35%
Overall (All Time): #156,078 of 4,157,543Top 4%
26
Patents All Time

Issued Patents All Time

Showing 25 most recent of 26 patents

Patent #TitleCo-InventorsDate
7772121 Method of forming a trench structure Liang-Yuh Chen, Israel Beinglass 2010-08-10
7427568 Method of forming an interconnect structure Liang-Yuh Chen, Israel Beinglass 2008-09-23
7375023 Method and apparatus for chemical mechanical polishing of semiconductor substrates Stan Tsai, Liang-Yuh Chen, Lizhong Sun, Shijian Li, Feng Q. Liu +2 more 2008-05-20
7344432 Conductive pad with ion exchange membrane for electrochemical mechanical polishing Liang-Yun Chen, Yuchun Wang, Yan Wang, Alain Duboust, Ralph Wadensweiler +9 more 2008-03-18
7323095 Integrated multi-step gap fill and all feature planarization for conductive materials Wei-Yung Hsu, Liang-Yuh Chen, Ratson Morad, Sasson Somekh 2008-01-29
7311592 Conductive polishing article for electrochemical mechanical polishing Liang-Yuh Chen, Yuchun Wang, Yan Wang, Alain Duboust, Ralph Wadensweiler +4 more 2007-12-25
7137879 Conductive polishing article for electrochemical mechanical polishing Liang-Yuh Chen, Yuchun Wang, Yan Wang, Alain Duboust, Ralph Wadensweiler +4 more 2006-11-21
7115516 Method of depositing a material layer Liang-Yuh Chen, Israel Beinglass 2006-10-03
7066800 Conductive polishing article for electrochemical mechanical polishing Liang-Yuh Chen, Yuchun Wang, Yan Wang, Alain Duboust, Ralph Wadensweiler +4 more 2006-06-27
7060606 Method and apparatus for chemical mechanical polishing of semiconductor substrates Stan Tsai, Liang-Yuh Chen, Lizhong Sun, Shijian Li, Feng Q. Liu +2 more 2006-06-13
6988942 Conductive polishing article for electrochemical mechanical polishing Liang-Yuh Chen, Yuchun Wang, Yan Wang, Alain Duboust, Ralph Wadensweiler +4 more 2006-01-24
6896776 Method and apparatus for electro-chemical processing Wei-Yung Hsu, Liang-Yuh Chen, Ratson Morad, Sasson Somekh 2005-05-24
6893548 Method of conditioning electrochemical baths in plating technology Robin Cheung, Liang-Yuh Chen, Yezdi Dordi, Paul Smith, Ratson Morad +2 more 2005-05-17
6884724 Method for dishing reduction and feature passivation in polishing processes Wei-Yung Hsu, Liang-Yuh Chen, Ratson Morad 2005-04-26
6821881 Method for chemical mechanical polishing of semiconductor substrates Stan Tsai, Liang-Yuh Chen, Lizhong Sun, Shijian Li, Feng Q. Liu +2 more 2004-11-23
6811680 Planarization of substrates using electrochemical mechanical polishing Liang-Yuh Chen, Wei-Yung Hsu, Alain Duboust, Ratson Morad 2004-11-02
6773507 Apparatus and method for fast-cycle atomic layer deposition Ravi Jallepally, Shih-Hung Li, Alain Duboust, Jun Zhao, Liang-Yuh Chen 2004-08-10
6677239 Methods and compositions for chemical mechanical polishing Wei-Yung Hsu, Gopalakrishna B. Prabhu, Lizhong Sun 2004-01-13
6436267 Method for achieving copper fill of high aspect ratio interconnect features Barry Chin, Liang-Yuh Chen, Robin Cheung, Peijun Ding, Yezdi Dordi +3 more 2002-08-20
6372633 Method and apparatus for forming metal interconnects Dan Maydan, Ashok Sinha, Zheng Xu, Liang Chen, Roderick C. Mosely +3 more 2002-04-16
6362099 Method for enhancing the adhesion of copper deposited by chemical vapor deposition Srinivas Gandikota, Dennis Cong, Liang-Yuh Chen, Sesh Ramaswami 2002-03-26
6258223 In-situ electroless copper seed layer enhancement in an electroplating system Robin Cheung, Yezdi Dordi, Peter Hey, Ratson Morad, Liang-Yuh Chen +2 more 2001-07-10
5766968 Micro mask comprising agglomerated material Michael D. Armacost, A. Richard Baker, Jr., Wayne S. Berry, Donald McAllpine Kenney, Thomas J. Licata 1998-06-16
5672537 Method for preparing a narrow angle defined trench in a substrate Donald M. Kenney, Walter E. Mlynko, Son Van Nguyen 1997-09-30
5610441 Angle defined trench conductor for a semiconductor device Donald M. Kenney, Walter E. Mlynko, Son V. Nguyen 1997-03-11