RM

Roderick C. Mosely

Applied Materials: 41 patents #220 of 7,310Top 4%
JT Jennings Technology: 3 patents #2 of 11Top 20%
TI Thomas & Betts International: 3 patents #82 of 424Top 20%
VL Vaccine Technology Limited: 2 patents #5 of 26Top 20%
JE Japan Energy: 1 patents #85 of 240Top 40%
Overall (All Time): #52,855 of 4,157,543Top 2%
51
Patents All Time

Issued Patents All Time

Showing 25 most recent of 51 patents

Patent #TitleCo-InventorsDate
10047430 Self-ionized and inductively-coupled plasma for sputtering and resputtering Peijun Ding, Rong Tao, Zheng Xu, Daniel C. Lubben, Suraj Rengarajan +7 more 2018-08-14
8696875 Self-ionized and inductively-coupled plasma for sputtering and resputtering Peijun Ding, Rong Tao, Zheng Xu, Daniel C. Lubben, Suraj Rengarajan +7 more 2014-04-15
8668816 Self-ionized and inductively-coupled plasma for sputtering and resputtering Peijun Ding, Rong Tao, Zheng Xu, Daniel C. Lubben, Suraj Rengarajan +7 more 2014-03-11
8324095 Integration of ALD tantalum nitride for copper metallization Hua Chung, Nirmalya Maity, Jick Yu, Mei Chang 2012-12-04
7802480 Method and apparatus for the detection of high pressure conditions in a vacuum-type electrical device Steven Jay Randazzo 2010-09-28
7604708 Cleaning of native oxide with hydrogen-containing radicals Bingxi Wood, Mark Kawaguchi, James S. Papanu, Chiukun Steven Lai, Chien-Teh Kao +2 more 2009-10-20
7499255 Vacuum-type electrical switching apparatus James Francis Domo, Lance Sabados, Steven Jay Randazzo, Joseph E. Oeschger, Mary Montesclaros 2009-03-03
7497122 Method and apparatus for the detection of high pressure conditions in a vacuum-type electrical device Mary Montesclaros, Steven Jay Randazzo, Bryce Sollazzi, Robert James Speciale 2009-03-03
7383733 Method and apparatus for the sonic detection of high pressure conditions in a vacuum switching device Steven Jay Randazzo, Li Lei, Ernest F. Bestel 2008-06-10
7313964 Method and apparatus for the detection of high pressure conditions in a vacuum-type electrical device Mary Montesclaros, Steven Jay Randazzo, Bryce Sollazzi, Robert James Speciale 2008-01-01
7302854 Method and apparatus for the detection of high pressure conditions in a vacuum-type electrical device John C. Egermeier, Steven Jay Randazzo, Bryce Sollazzi 2007-12-04
7048837 End point detection for sputtering and resputtering Sasson Somekh, Marc Schweitzer, John C. Forster, Zheng Xu, Barry Chin +1 more 2006-05-23
7049226 Integration of ALD tantalum nitride for copper metallization Hua Chung, Nirmalya Maity, Jick Yu, Mei Chang 2006-05-23
6933021 Method of TiSiN deposition using a chemical vapor deposition (CVD) process Jing-Pei (Connie) Chou, Chien-Teh Kao, Chiukin Lai, Mei Chang 2005-08-23
6905965 Reactive preclean prior to metallization for sub-quarter micron application Suchitra Subrahmanyan, Liang-Yuh Chen 2005-06-14
6743714 Low temperature integrated metallization process and apparatus Hong Mei Zhang, Fusen Chen, Ted Guo, Liang-Yuh Chen 2004-06-01
6726776 Low temperature integrated metallization process and apparatus Hong Mei Zhang, Fusen Chen, Ted Guo 2004-04-27
6693030 Reactive preclean prior to metallization for sub-quarter micron application Suchitra Subrahmanyan, Liang-Yuh Chen 2004-02-17
6607976 Copper interconnect barrier layer structure and formation method Ling Chen, Seshadri Ganguli, Christophe Marcadal, Wei Cao, Mei Chang 2003-08-19
6518176 Method of selective formation of a barrier layer for a contact level via Ted Guo, Liang-Yuh Chen, Suchitra Subrahmanyan 2003-02-11
6509274 Method for forming aluminum lines over aluminum-filled vias in a semiconductor substrate Ted Guo, Jing-Pei (Connie) Chou, Liang-Yuh Chen 2003-01-21
6500742 Construction of a film on a semiconductor wafer Chyi Chern, Michal Danek, Marvin Liao, Karl A. Littau, Ivo Raaijmakers +1 more 2002-12-31
6458684 Single step process for blanket-selective CVD aluminum deposition Ted Guo, Liang-Yuh Chen, Mehul Naik 2002-10-01
6444036 Construction of a film on a semiconductor wafer Chyi Chern, Michal Danek, Marvin Liao, Karl A. Littau, Ivo Raaijmakers +1 more 2002-09-03
6436819 Nitrogen treatment of a metal nitride/metal stack Zhi ZHANG, David Pung, Nitin Khurana, Hong Mei Zhang 2002-08-20