Issued Patents All Time
Showing 1–17 of 17 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12322592 | Deposition of silicon-based dielectric films | Geetika Bajaj, Prerna Goradia, Seshadri Ganguli, Srinivas Gandikota, Robert Jan Visser | 2025-06-03 |
| 10047430 | Self-ionized and inductively-coupled plasma for sputtering and resputtering | Peijun Ding, Rong Tao, Zheng Xu, Daniel C. Lubben, Michael Miller +7 more | 2018-08-14 |
| 8696875 | Self-ionized and inductively-coupled plasma for sputtering and resputtering | Peijun Ding, Rong Tao, Zheng Xu, Daniel C. Lubben, Michael Miller +7 more | 2014-04-15 |
| 8668816 | Self-ionized and inductively-coupled plasma for sputtering and resputtering | Peijun Ding, Rong Tao, Zheng Xu, Daniel C. Lubben, Michael Miller +7 more | 2014-03-11 |
| 7749361 | Multi-component doping of copper seed layer | Jie Chen, Peijun Ding, Ling Chen, Tram Vo | 2010-07-06 |
| 7687909 | Metal / metal nitride barrier layer for semiconductor device applications | Peijun Ding, Zheng Xu, Hong Mei Zhang, Xianmin Tang, Praburam Gopalraja +7 more | 2010-03-30 |
| 7253109 | Method of depositing a tantalum nitride/tantalum diffusion barrier layer system | Peijun Ding, Zheng Xu, Hong Mei Zhang, Xianmin Tang, Praburam Gopalraja +7 more | 2007-08-07 |
| 7014887 | Sequential sputter and reactive precleans of vias and contacts | Barney M. Cohen, Xiangbing Li, Kenny King-Tai Ngan, Peijun Ding | 2006-03-21 |
| 6936842 | Method and apparatus for process monitoring | Michael Anthony Wood, Haojiang Li, Moshe Sarfaty, Kevin Song | 2005-08-30 |
| 6911124 | Method of depositing a TaN seed layer | Xianmin Tang, Praburam Gopalraja, John C. Forster, Jianming Fu, Peijun Ding | 2005-06-28 |
| 6908865 | Method and apparatus for cleaning substrates | Martin Kranz, Srinivas Guggilla, Mei Chang, Gongda Yao, Nitin Khurana +1 more | 2005-06-21 |
| 6589890 | Precleaning process for metal plug that minimizes damage to low-&kgr; dielectric | Barney M. Cohen, Kenny King-Tai Ngan | 2003-07-08 |
| 6579730 | Monitoring process for oxide removal | Haojiang Li, Peijun Ding | 2003-06-17 |
| 6368880 | Barrier applications for aluminum planarization | Shri Singhvi, Peijun Ding, Gongda Yao | 2002-04-09 |
| 6346489 | Precleaning process for metal plug that minimizes damage to low-&kgr; dielectric | Barney M. Cohen, Kenny King-Tai Ngan | 2002-02-12 |
| 6313033 | Ionized metal plasma Ta, TaNx, W, and WNx liners for gate electrode applications | Tony P. Chiang, Bingxi Sun, Peijun Ding, Barry Chin | 2001-11-06 |
| 6207558 | Barrier applications for aluminum planarization | Shri Singhvi, Peijun Ding, Gongda Yao | 2001-03-27 |