| 7053002 |
Plasma preclean with argon, helium, and hydrogen gases |
Kenny King-Tai Ngan, Xiangbing Li |
2006-05-30 |
| 7014887 |
Sequential sputter and reactive precleans of vias and contacts |
Suraj Rengarajan, Xiangbing Li, Kenny King-Tai Ngan, Peijun Ding |
2006-03-21 |
| 6589890 |
Precleaning process for metal plug that minimizes damage to low-&kgr; dielectric |
Suraj Rengarajan, Kenny King-Tai Ngan |
2003-07-08 |
| 6547934 |
Reduction of metal oxide in a dual frequency etch chamber |
Gilbert Hausmann, Vijay D. Parkhe, Zheng Xu |
2003-04-15 |
| 6346489 |
Precleaning process for metal plug that minimizes damage to low-&kgr; dielectric |
Suraj Rengarajan, Kenny King-Tai Ngan |
2002-02-12 |
| 6313042 |
Cleaning contact with successive fluorine and hydrogen plasmas |
Jingang Su, Kenny King-Tai Ngan, Jr-Jyan Chen |
2001-11-06 |
| 6110836 |
Reactive plasma etch cleaning of high aspect ratio openings |
Jingang Su, Kenny King-Tai Ngan |
2000-08-29 |
| 6079354 |
Thermal post-deposition treatment of halogen-doped films to improve film stability and reduce halogen migration to interconnect layers |
Ted Guo, Amrita Verma |
2000-06-27 |
| 6077353 |
Pedestal insulator for a pre-clean chamber |
Mohamed Al-Sharif, Bradley O. Stimson, Debabrata Ghosh, Kenny King-Tai Ngan, Murali Narasimhan |
2000-06-20 |
| 5763010 |
Thermal post-deposition treatment of halogen-doped films to improve film stability and reduce halogen migration to interconnect layers |
Ted Guo, Amrita Verma |
1998-06-09 |
| 5688358 |
R.F. plasma reactor with larger-than-wafer pedestal conductor |
Yoichiro Tanaka, Megumi Taoka |
1997-11-18 |
| 5685941 |
Inductively coupled plasma reactor with top electrode for enhancing plasma ignition |
John C. Forster, Bradley O. Stimson, George Arthur Proulx |
1997-11-11 |
