KN

Kenny King-Tai Ngan

Applied Materials: 45 patents #188 of 7,310Top 3%
📍 Fremont, CA: #276 of 9,298 inventorsTop 3%
🗺 California: #9,453 of 386,348 inventorsTop 3%
Overall (All Time): #65,956 of 4,157,543Top 2%
45
Patents All Time

Issued Patents All Time

Showing 1–25 of 45 patents

Patent #TitleCo-InventorsDate
7504008 Refurbishment of sputtering targets Trung T. Doan 2009-03-17
7323230 Coating for aluminum component Trung T. Doan 2008-01-29
7066795 Polishing pad conditioner with shaped abrasive patterns and channels Venkata R. Balagani, George Lazari 2006-06-27
7053002 Plasma preclean with argon, helium, and hydrogen gases Barney M. Cohen, Xiangbing Li 2006-05-30
7041200 Reducing particle generation during sputter deposition Hien Minh Le, Keith A. Miller, Hoa Kieu 2006-05-09
7014887 Sequential sputter and reactive precleans of vias and contacts Barney M. Cohen, Suraj Rengarajan, Xiangbing Li, Peijun Ding 2006-03-21
7006888 Semiconductor wafer preheating Hougong Wang, Zheng Xu 2006-02-28
6945857 Polishing pad conditioner and methods of manufacture and recycling Trung T. Doan, Venkata R. Balagani 2005-09-20
6899799 Method and apparatus for improving sidewall coverage during sputtering in a chamber having an inductively coupled plasma Ying HUI, Seshadri Ramaswami 2005-05-31
6672864 Method and apparatus for processing substrates in a system having high and low pressure areas Hougong Wang, Zheng Xu 2004-01-06
6625003 Method and apparatus for balancing an electrostatic force produced by an electrostatic chuck David H. Loo, Jr-Jyan Chen, Bradley O. Stimson 2003-09-23
6589890 Precleaning process for metal plug that minimizes damage to low-&kgr; dielectric Barney M. Cohen, Suraj Rengarajan 2003-07-08
6426282 Method of forming solder bumps on a semiconductor wafer Dinesh Saigal, Shankarram Athreya, Lisa Yang 2002-07-30
6420260 Ti/Tinx underlayer which enables a highly <111> oriented aluminum interconnect Seshadri Ramaswami 2002-07-16
6372301 Method of improving adhesion of diffusion layers on fluorinated silicon dioxide Murali Narasimhan, Vikram Pavate, Xiangbing Li 2002-04-16
6346489 Precleaning process for metal plug that minimizes damage to low-&kgr; dielectric Barney M. Cohen, Suraj Rengarajan 2002-02-12
6313042 Cleaning contact with successive fluorine and hydrogen plasmas Barney M. Cohen, Jingang Su, Jr-Jyan Chen 2001-11-06
6267423 End effector for semiconductor wafer transfer device and method of moving a wafer with an end effector Dan Marohl 2001-07-31
6238533 Integrated PVD system for aluminum hole filling using ionized metal adhesion layer Peter Satitpunwaycha, Gongda Yao, Zheng Xu 2001-05-29
6207027 Method to reduce overhead time in an ion metal plasma process 2001-03-27
6176978 Pasting layer formation method for high density plasma deposition chambers 2001-01-23
6149777 Method of producing smooth titanium nitride films having low resistivity Seshadri Ramaswami 2000-11-21
6149784 Sputtering chamber shield promoting reliable plasma ignition Jingang Su, Nelson Yee, John C. Forster, Lisa Yang 2000-11-21
6110836 Reactive plasma etch cleaning of high aspect ratio openings Barney M. Cohen, Jingang Su 2000-08-29
6077353 Pedestal insulator for a pre-clean chamber Mohamed Al-Sharif, Bradley O. Stimson, Debabrata Ghosh, Barney M. Cohen, Murali Narasimhan 2000-06-20