Issued Patents All Time
Showing 25 most recent of 36 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10158115 | Flash evaporation of solid state battery component | Weston Arthur Hermann, David E. Berkstresser, Tim Holme, Arnold Allenic | 2018-12-18 |
| 9786905 | Iron, fluorine, sulfur compounds for battery cell cathodes | Timothy P. Holme, Joseph Han, Weston Arthur Hermann, Rainer Fasching, Cheng-Chieh Chao | 2017-10-10 |
| 9692039 | Nanostructured materials for electrochemical conversion reactions | Timothy P. Holme, Jagdeep Singh, Rainer Fasching, Joseph Han, Weston Arthur Hermann +2 more | 2017-06-27 |
| 9640793 | Nanostructured materials for electrochemical conversion reactions | Timothy P. Holme, Jagdeep Singh, Rainer Fasching, Joseph Han, Weston Arthur Hermann +2 more | 2017-05-02 |
| 9246158 | Nanostructured materials for electrochemical conversion reactions | Timothy P. Holme, Jagdeep Singh, Rainer Fasching, Joseph Han, Weston Arthur Hermann +2 more | 2016-01-26 |
| 9222165 | Cooled PVD shield | Akihiro Hosokawa, Hienminh Huu Le, Makoto Inagawa | 2015-12-29 |
| 8961756 | Ganged scanning of multiple magnetrons, especially two level folded magnetrons | Makoto Inagawa, Hien Minh Le, Akihiro Hosokawa, John M. White | 2015-02-24 |
| 8444766 | System and method for recycling a gas used to deposit a semiconductor layer | Jason Stephens, Guleid Hussen | 2013-05-21 |
| 8298625 | Multiple phase RF power for electrode of plasma chamber | John M. White | 2012-10-30 |
| 7939747 | Solar heating method and apparatus | Marc Schweitzer | 2011-05-10 |
| 7815782 | PVD target | Makoto Inagawa, Akihiro Hosokawa, Hienminh Huu Le, Jrjyan Jerry CHEN | 2010-10-19 |
| 7163607 | Process kit for improved power coupling through a workpiece in a semiconductor wafer processing system | Mitsuhiro Kaburaki, John C. Forster, Eric Delaurentis, Praburam Gopalraja, Patricia Rodriguez +1 more | 2007-01-16 |
| 6824658 | Partial turn coil for generating a plasma | Praburam Gopalraja | 2004-11-30 |
| 6723214 | Apparatus for improved power coupling through a workpiece in a semiconductor wafer processing system | Mitsuhiro Kaburaki, John C. Forster, Eric Delaurentis, Praburam Gopalraja, Patricia Rodriguez +1 more | 2004-04-20 |
| 6719883 | Use of variable RF generator to control coil voltage distribution | — | 2004-04-13 |
| 6673724 | Pulsed-mode RF bias for side-wall coverage improvement | John C. Forster, Praburam Gopalraja, Liubo Hong | 2004-01-06 |
| 6625003 | Method and apparatus for balancing an electrostatic force produced by an electrostatic chuck | David H. Loo, Jr-Jyan Chen, Kenny King-Tai Ngan | 2003-09-23 |
| 6554979 | Method and apparatus for bias deposition in a modulating electric field | — | 2003-04-29 |
| 6461483 | Method and apparatus for performing high pressure physical vapor deposition | Praburam Gopalraja, John C. Forster, Wei Wang | 2002-10-08 |
| 6345588 | Use of variable RF generator to control coil voltage distribution | — | 2002-02-12 |
| 6344419 | Pulsed-mode RF bias for sidewall coverage improvement | John C. Forster, Praburam Gopalraja, Liubo Hong | 2002-02-05 |
| 6297595 | Method and apparatus for generating a plasma | John C. Forster | 2001-10-02 |
| 6264812 | Method and apparatus for generating a plasma | Ivo Raaijmakers, John C. Forster | 2001-07-24 |
| 6254738 | Use of variable impedance having rotating core to control coil sputter distribution | Kenneth Smyth, Praburam Gopalraja | 2001-07-03 |
| 6254746 | Recessed coil for generating a plasma | Anantha K. Subramani, John C. Forster, Sergio Edelstein, Howard Grunes, Avi Tepman +1 more | 2001-07-03 |