AH

Akihiro Hosokawa

Applied Materials: 34 patents #313 of 7,310Top 5%
AT Applied Komatsu Technology: 6 patents #6 of 62Top 10%
DC Dainippon Screen Mfg. Co.: 4 patents #193 of 977Top 20%
TO Toyota: 2 patents #10,861 of 26,838Top 45%
QC Qingdao Haier Washing Machine Co.: 1 patents #87 of 190Top 50%
RI Railway Technical Research Institute: 1 patents #70 of 233Top 35%
Tdk: 1 patents #2,493 of 3,796Top 70%
HG Haier Group: 1 patents #80 of 223Top 40%
Overall (All Time): #56,620 of 4,157,543Top 2%
49
Patents All Time

Issued Patents All Time

Showing 25 most recent of 49 patents

Patent #TitleCo-InventorsDate
10294559 Target cooling through gun drilled holes Yoshiaki Tanase, Makoto Inagawa 2019-05-21
9222165 Cooled PVD shield Bradley O. Stimson, Hienminh Huu Le, Makoto Inagawa 2015-12-29
8961756 Ganged scanning of multiple magnetrons, especially two level folded magnetrons Makoto Inagawa, Hien Minh Le, Bradley O. Stimson, John M. White 2015-02-24
8875547 Washing machine, and ozone generator Masami Suzuki 2014-11-04
8783390 Vehicle drive apparatus Yoshinori Maeda, Yousuke Suzuki, Michitaka Tsuchida, Kazuya Okumura, Tadahiro Oshiumi +2 more 2014-07-22
8714663 Wheel brake/drive force control device Yoshinori Maeda, Yasuhiro Oshiumi, Michitaka Tsuchida, Kazuya Okumura, Kensuke Yoshizue +1 more 2014-05-06
8574411 Reactive sputtering chamber with gas distribution tubes John M. White, Yan Ye 2013-11-05
8500975 Method and apparatus for sputtering onto large flat panels Hien Minh Le, Avi Tepman 2013-08-06
8206548 Substrate processing apparatus and substrate processing method Itsuki Kajino, Kozo Terashima 2012-06-26
8182661 Controllable target cooling Yoshiaki Tanase, Makoto Inagawa 2012-05-22
7976635 Dual substrate loadlock process equipment Shinichi Kurita, Wendell T. Blonigan 2011-07-12
7879210 Partially suspended rolling magnetron Makoto Inagawa, John M. White 2011-02-01
7815782 PVD target Makoto Inagawa, Bradley O. Stimson, Hienminh Huu Le, Jrjyan Jerry CHEN 2010-10-19
7652223 Electron beam welding of sputtering target tiles Yoshiaki Tanase 2010-01-26
7644745 Bonding of target tiles to backing plate with patterned bonding agent Hien Minh Le 2010-01-12
7641434 Dual substrate loadlock process equipment Shinichi Kurita, Wendell T. Blonigan 2010-01-05
7628899 Apparatus and method of positioning a multizone magnetron assembly John M. White, Hien Minh Le 2009-12-08
7566900 Integrated metrology tools for monitoring and controlling large area substrate processing chambers Hienminh Huu Le 2009-07-28
7550055 Elastomer bonding of large area sputtering target Hienminh Huu Le 2009-06-23
7505832 Method and apparatus for determining a substrate exchange position in a processing system Dongchoon Suh, Hung T. Nguyen 2009-03-17
7442900 Chamber for uniform heating of large area substrates Makoto Inagawa 2008-10-28
7432184 Integrated PVD system using designated PVD chambers Makoto Inagawa, Hienminh Huu Le, John M. White 2008-10-07
7429718 Heating and cooling of substrate support Makoto Inagawa 2008-09-30
7316763 Multiple target tiles with complementary beveled edges forming a slanted gap therebetween Hien Minh Le 2008-01-08
7073834 Multiple section end effector assembly Takayuki Matsumoto 2006-07-11