Issued Patents All Time
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7780814 | Wafer pre-clean reactor cable termination for selective suppression/reflection of source and bias frequency cross products | John Pipitone, Mei Po (Mabel) Yeung | 2010-08-24 |
| 6254738 | Use of variable impedance having rotating core to control coil sputter distribution | Bradley O. Stimson, Praburam Gopalraja | 2001-07-03 |
| 6083344 | Multi-zone RF inductively coupled source configuration | Hiroji Hanawa, Tetsuya Ishikawa, Manus Wong, Shijian Li, Kaveh Niazi +3 more | 2000-07-04 |
| 5643364 | Plasma chamber with fixed RF matching | Jun Zhao, Stefan Wolff, William Taylor, Gerald McNutt | 1997-07-01 |