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Multi-shield spinal access system |
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Multi-shield spinal access system |
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Multi-shield spinal access system |
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Multi-shield spinal access system |
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Multi-shield spinal access system |
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Multi-shield spinal access system |
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Multi-shield spinal access system |
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Electrostatic end effector apparatus, systems and methods |
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Method and apparatus for monitoring and adjusting chamber impedance |
Sebastien Raoux, Mandar Mudholkar |
2006-02-28 |
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Method and apparatus for cleaning an exhaust line in a semiconductor processing system |
Ben Pang, David Cheung, Sebastion Raoux, Mark Fodor |
2004-02-10 |
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Apparatus for cleaning an exhaust line in a semiconductor processing system |
Ben Pang, David Cheung, Sebastien Raoux, Mark Fodor |
2004-01-20 |
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Safety guard for an RF connector |
Richard R. Mett, Mark W. Curry |
2003-04-01 |
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Method and apparatus for reducing perfluorocompound gases from substrate processing equipment emissions |
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2003-02-11 |
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Multiple wafer lift apparatus and associated method |
— |
2002-11-26 |
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Safety guard for an RF connector |
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2001-08-14 |
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Parallel plate apparatus for in-situ vacuum line cleaning for substrate processing equipment |
Ben Pang, David Cheung, Sebastien Raoux, Mark Fodor |
2001-02-27 |
| 6194628 |
Method and apparatus for cleaning a vacuum line in a CVD system |
Ben Pang, David Cheung, Sebastien Raoux, Mark Fodor |
2001-02-27 |
| 6187072 |
Method and apparatus for reducing perfluorocompound gases from substrate processing equipment emissions |
David Cheung, Sebastien Raoux, Judy H. Huang, Mark Fodor, Kevin Fairbairn |
2001-02-13 |
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Gas feedthrough with electrostatic discharge characteristic |
Kuo-Shih Liu, Ernest Cheung, Prasanth Kumar, John Ferguson, Michael G. Friebe +1 more |
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Variable capacitor |
— |
2000-11-14 |
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Substrate processing chamber with tunable impedance |
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2000-10-24 |
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Mixed frequency CVD apparatus |
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Plasma chamber with fixed RF matching |
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1997-07-01 |
