| 12402909 |
Multi-shield spinal access system |
Daniel Thommen, Joern Richter, Michael Wang, Richard Assaker, Richard G. Fessler +4 more |
2025-09-02 |
|
| 11883064 |
Multi-shield spinal access system |
Daniel Thommen, Joern Richter, Michael Wang, Richard Assaker, Richard G. Fessler +4 more |
2024-01-30 |
|
| 11712264 |
Multi-shield spinal access system |
Daniel Thommen, Joern Richter, Michael Wang, Richard Assaker, Richard G. Fessler +6 more |
2023-08-01 |
|
| 11672562 |
Multi-shield spinal access system |
Daniel Thommen, Joern Richter, Michael Wang, Richard Assaker, Richard G. Fessler +4 more |
2023-06-13 |
|
| 11000312 |
Multi-shield spinal access system |
Daniel Thommen, Joern Richter, Michael Wang, Richard Assaker, Richard G. Fessler +6 more |
2021-05-11 |
|
| 10987129 |
Multi-shield spinal access system |
Daniel Thommen, Joern Richter, Michael Wang, Richard Assaker, Richard G. Fessler +4 more |
2021-04-27 |
|
| 10874425 |
Multi-shield spinal access system |
Daniel Thommen, Joern Richter, Michael Wang, Richard Assaker, Richard G. Fessler +4 more |
2020-12-29 |
|
| 8599531 |
Electrostatic end effector apparatus, systems and methods |
Satish Sundar, Jeffrey C. Hudgens, Prudhvi R. Chintalapati, William P. Laceky, Jeffrey A. Brodine +2 more |
2013-12-03 |
$15,303,000 |
| 7004107 |
Method and apparatus for monitoring and adjusting chamber impedance |
Sebastien Raoux, Mandar Mudholkar |
2006-02-28 |
$21,386,000 |
| 6689930 |
Method and apparatus for cleaning an exhaust line in a semiconductor processing system |
Ben Pang, David Cheung, Sebastion Raoux, Mark Fodor |
2004-02-10 |
$27,822,000 |
| 6680420 |
Apparatus for cleaning an exhaust line in a semiconductor processing system |
Ben Pang, David Cheung, Sebastien Raoux, Mark Fodor |
2004-01-20 |
$55,713,000 |
| 6539621 |
Safety guard for an RF connector |
Richard R. Mett, Mark W. Curry |
2003-04-01 |
$20,539,000 |
| 6517913 |
Method and apparatus for reducing perfluorocompound gases from substrate processing equipment emissions |
David Cheung, Sebastien Raoux, Judy H. Huang, Mark Fodor, Kevin Fairbairn |
2003-02-11 |
$17,783,000 |
| 6485248 |
Multiple wafer lift apparatus and associated method |
— |
2002-11-26 |
$35,140,000 |
| 6358573 |
Mixed frequency CVD process |
Sebastien Raoux, Mandar Mudholkar, Mark Fodor, Judy H. Huang, David Silvetti +2 more |
2002-03-19 |
$47,426,000 |
| 6273736 |
Safety guard for an RF connector |
Richard R. Mett, Mark W. Curry |
2001-08-14 |
$56,947,000 |
| 6194628 |
Method and apparatus for cleaning a vacuum line in a CVD system |
Ben Pang, David Cheung, Sebastien Raoux, Mark Fodor |
2001-02-27 |
$52,416,000 |
| 6193802 |
Parallel plate apparatus for in-situ vacuum line cleaning for substrate processing equipment |
Ben Pang, David Cheung, Sebastien Raoux, Mark Fodor |
2001-02-27 |
$52,416,000 |
| 6187072 |
Method and apparatus for reducing perfluorocompound gases from substrate processing equipment emissions |
David Cheung, Sebastien Raoux, Judy H. Huang, Mark Fodor, Kevin Fairbairn |
2001-02-13 |
$172,556,000 |
| 6170430 |
Gas feedthrough with electrostatic discharge characteristic |
Kuo-Shih Liu, Ernest Cheung, Prasanth Kumar, John Ferguson, Michael G. Friebe +1 more |
2001-01-09 |
$65,370,000 |
| 6147855 |
Variable capacitor |
— |
2000-11-14 |
$66,218,000 |
| 6136388 |
Substrate processing chamber with tunable impedance |
Sebastien Raoux, Mandar Mudholkar |
2000-10-24 |
$85,890,000 |
| 6098568 |
Mixed frequency CVD apparatus |
Sebastien Raoux, Mandar Mudholkar, Mark Fodor, Judy H. Huang, David Silvetti +2 more |
2000-08-08 |
$74,240,000 |
| 5643364 |
Plasma chamber with fixed RF matching |
Jun Zhao, Stefan Wolff, Kenneth Smyth, Gerald McNutt |
1997-07-01 |
$28,802,000 |
