Issued Patents All Time
Showing 1–24 of 24 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12402909 | Multi-shield spinal access system | Daniel Thommen, Joern Richter, Michael Wang, Richard Assaker, Richard G. Fessler +4 more | 2025-09-02 |
| 11883064 | Multi-shield spinal access system | Daniel Thommen, Joern Richter, Michael Wang, Richard Assaker, Richard G. Fessler +4 more | 2024-01-30 |
| 11712264 | Multi-shield spinal access system | Daniel Thommen, Joern Richter, Michael Wang, Richard Assaker, Richard G. Fessler +6 more | 2023-08-01 |
| 11672562 | Multi-shield spinal access system | Daniel Thommen, Joern Richter, Michael Wang, Richard Assaker, Richard G. Fessler +4 more | 2023-06-13 |
| 11000312 | Multi-shield spinal access system | Daniel Thommen, Joern Richter, Michael Wang, Richard Assaker, Richard G. Fessler +6 more | 2021-05-11 |
| 10987129 | Multi-shield spinal access system | Daniel Thommen, Joern Richter, Michael Wang, Richard Assaker, Richard G. Fessler +4 more | 2021-04-27 |
| 10874425 | Multi-shield spinal access system | Daniel Thommen, Joern Richter, Michael Wang, Richard Assaker, Richard G. Fessler +4 more | 2020-12-29 |
| 8599531 | Electrostatic end effector apparatus, systems and methods | Satish Sundar, Jeffrey C. Hudgens, Prudhvi R. Chintalapati, William P. Laceky, Jeffrey A. Brodine +2 more | 2013-12-03 |
| 7004107 | Method and apparatus for monitoring and adjusting chamber impedance | Sebastien Raoux, Mandar Mudholkar | 2006-02-28 |
| 6689930 | Method and apparatus for cleaning an exhaust line in a semiconductor processing system | Ben Pang, David Cheung, Sebastion Raoux, Mark Fodor | 2004-02-10 |
| 6680420 | Apparatus for cleaning an exhaust line in a semiconductor processing system | Ben Pang, David Cheung, Sebastien Raoux, Mark Fodor | 2004-01-20 |
| 6539621 | Safety guard for an RF connector | Richard R. Mett, Mark W. Curry | 2003-04-01 |
| 6517913 | Method and apparatus for reducing perfluorocompound gases from substrate processing equipment emissions | David Cheung, Sebastien Raoux, Judy H. Huang, Mark Fodor, Kevin Fairbairn | 2003-02-11 |
| 6485248 | Multiple wafer lift apparatus and associated method | — | 2002-11-26 |
| 6358573 | Mixed frequency CVD process | Sebastien Raoux, Mandar Mudholkar, Mark Fodor, Judy H. Huang, David Silvetti +2 more | 2002-03-19 |
| 6273736 | Safety guard for an RF connector | Richard R. Mett, Mark W. Curry | 2001-08-14 |
| 6193802 | Parallel plate apparatus for in-situ vacuum line cleaning for substrate processing equipment | Ben Pang, David Cheung, Sebastien Raoux, Mark Fodor | 2001-02-27 |
| 6194628 | Method and apparatus for cleaning a vacuum line in a CVD system | Ben Pang, David Cheung, Sebastien Raoux, Mark Fodor | 2001-02-27 |
| 6187072 | Method and apparatus for reducing perfluorocompound gases from substrate processing equipment emissions | David Cheung, Sebastien Raoux, Judy H. Huang, Mark Fodor, Kevin Fairbairn | 2001-02-13 |
| 6170430 | Gas feedthrough with electrostatic discharge characteristic | Kuo-Shih Liu, Ernest Cheung, Prasanth Kumar, John Ferguson, Michael G. Friebe +1 more | 2001-01-09 |
| 6147855 | Variable capacitor | — | 2000-11-14 |
| 6136388 | Substrate processing chamber with tunable impedance | Sebastien Raoux, Mandar Mudholkar | 2000-10-24 |
| 6098568 | Mixed frequency CVD apparatus | Sebastien Raoux, Mandar Mudholkar, Mark Fodor, Judy H. Huang, David Silvetti +2 more | 2000-08-08 |
| 5643364 | Plasma chamber with fixed RF matching | Jun Zhao, Stefan Wolff, Kenneth Smyth, Gerald McNutt | 1997-07-01 |