Issued Patents All Time
Showing 1–6 of 6 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7004107 | Method and apparatus for monitoring and adjusting chamber impedance | Sebastien Raoux, William Taylor | 2006-02-28 |
| 6358573 | Mixed frequency CVD process | Sebastien Raoux, William Taylor, Mark Fodor, Judy H. Huang, David Silvetti +2 more | 2002-03-19 |
| 6162709 | Use of an asymmetric waveform to control ion bombardment during substrate processing | Sebastien Raoux | 2000-12-19 |
| 6136388 | Substrate processing chamber with tunable impedance | Sebastien Raoux, William Taylor | 2000-10-24 |
| 6098568 | Mixed frequency CVD apparatus | Sebastien Raoux, William Taylor, Mark Fodor, Judy H. Huang, David Silvetti +2 more | 2000-08-08 |
| 6041734 | Use of an asymmetric waveform to control ion bombardment during substrate processing | Sebastien Raoux | 2000-03-28 |