{"@context": "https://schema.org", "@type": "BreadcrumbList", "itemListElement": [{"@type": "ListItem", "position": 1, "name": "Home", "item": "https://www.patentleaderboard.com/"}, {"@type": "ListItem", "position": 2, "name": "Applied Materials", "item": "https://www.patentleaderboard.com/company/applied-materials"}, {"@type": "ListItem", "position": 3, "name": "Mandar Mudholkar", "item": "https://www.patentleaderboard.com/inventor/fl:ma_ln:mudholkar-1"}]}
Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
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Mandar Mudholkar — 6 Patents

Applied Materials: 6 patents #1,938 of 7,310Top 30%
Fremont, CA: #2,737 of 9,298 inventorsTop 30%
California: #94,478 of 386,348 inventorsTop 25%
Overall (All Time): #779,687 of 4,157,543Top 20%
6 Patents All Time
Mandar Mudholkar has been granted 6 US patents while listed as an inventor at Applied Materials. The first was granted in 2000 and the most recent in February 2006. Mandar Mudholkar ranks #779,687 of 4,157,543 US inventors in our database (top 18.8%). Patent records list Mandar Mudholkar in Fremont, CA, US.

Patents per Year

Patents granted per year, 2000 to 2006Bar chart with a peak of 4 patents in 2000.peak 42000: 4 patents20002002: 1 patents20022006: 1 patents2006

Issued Patents All Time

Showing 1–6 of 6 patents

Patent #TitleCo-InventorsDateApprox Value ⓘ
7004107 Method and apparatus for monitoring and adjusting chamber impedance Sebastien Raoux, William Taylor 2006-02-28 $21,386,000
6358573 Mixed frequency CVD process Sebastien Raoux, William Taylor, Mark Fodor, Judy H. Huang, David Silvetti +2 more 2002-03-19 $47,426,000
6162709 Use of an asymmetric waveform to control ion bombardment during substrate processing Sebastien Raoux 2000-12-19 $51,987,000
6136388 Substrate processing chamber with tunable impedance Sebastien Raoux, William Taylor 2000-10-24 $85,890,000
6098568 Mixed frequency CVD apparatus Sebastien Raoux, William Taylor, Mark Fodor, Judy H. Huang, David Silvetti +2 more 2000-08-08 $74,240,000
6041734 Use of an asymmetric waveform to control ion bombardment during substrate processing Sebastien Raoux 2000-03-28 $192,295,000