| 12272570 |
Systems and methods for metastable activated radical selective strip and etch using dual plenum showerhead |
Dengliang Yang, Haoquan Fang, Gnanamani Amburose, Eunsuk Ko, Wei Luo +1 more |
2025-04-08 |
|
| 12272571 |
Systems and methods for metastable activated radical selective strip and etch using dual plenum showerhead |
Dengliang Yang, Haoquan Fang, Gnanamani Amburose, Eunsuk Ko, Wei Luo +1 more |
2025-04-08 |
|
| 12211709 |
Systems and methods for metastable activated radical selective strip and etch using dual plenum showerhead |
Dengliang Yang, Haoquan Fang, Gnanamani Amburose, Eunsuk Ko, Weiyi Luo +1 more |
2025-01-28 |
|
| 11694911 |
Systems and methods for metastable activated radical selective strip and etch using dual plenum showerhead |
Dengliang Yang, Haoquan Fang, Gnanamani Amburose, Eunsuk Ko, Weiyi Luo +1 more |
2023-07-04 |
|
| 11062897 |
Metal doped carbon based hard mask removal in semiconductor fabrication |
Yongsik Yu, Kirk Ostrowski, Nikkon Ghosh, Karthik S. Colinjivadi, Samantha Tan +2 more |
2021-07-13 |
$378,432,000 |
| 10267728 |
Systems and methods for detecting oxygen in-situ in a substrate area of a substrate processing system |
Dengliang Yang, Ilia Kalinovski, Haoquan Fang |
2019-04-23 |
$38,920,000 |
| 10109476 |
Substrate processing method for depositing a barrier layer to prevent photoresist poisoning |
Ilia Kalinovski |
2018-10-23 |
$28,319,000 |
| 9941108 |
High dose implantation strip (HDIS) in H2 base chemistry |
Haruhiro Harry Goto |
2018-04-10 |
|
| 9838429 |
Dynamic access policies |
David Van |
2017-12-05 |
$8,912,000 |
| 9613825 |
Photoresist strip processes for improved device integrity |
Roey Shaviv, Kirk Ostrowski, Joon Park, Bayu Thedjoisworo, Patrick J. Lord |
2017-04-04 |
|
| 9591738 |
Plasma generator systems and methods of forming plasma |
Huatan Qiu, Prashanth Kothnur |
2017-03-07 |
|
| 9564344 |
Ultra low silicon loss high dose implant strip |
Haoquan Fang, Jack Kuo, Ilia Kalinovski, Zhao Li, Guhua Yao +2 more |
2017-02-07 |
|
| 9514954 |
Peroxide-vapor treatment for enhancing photoresist-strip performance and modifying organic films |
Bayu Thedjoisworo, Bradley Jon Jacobs, Ivan L. Berry, III |
2016-12-06 |
$22,040,000 |
| 9397011 |
Systems and methods for reducing copper contamination due to substrate processing chambers with components made of alloys including copper |
Haoquan Fang, Yuk-Hong Ting |
2016-07-19 |
$10,345,000 |
| 9209000 |
Gas flow distribution receptacles, plasma generator systems, and methods for performing plasma stripping processes |
Huatan Qiu, Woody Chung, Anirban Guha |
2015-12-08 |
|
| 9034773 |
Removal of native oxide with high selectivity |
Bayu Thedjoisworo, Joon Park |
2015-05-19 |
|
| 8916477 |
Polysilicon etch with high selectivity |
Bayu Thedjoisworo, Jack Kuo, Joon Park |
2014-12-23 |
|
| 8864935 |
Plasma generator apparatus |
James A. Fair, Vincent Decaux, Anirban Guha, John H. Keller, Peter Jagusch |
2014-10-21 |
|
| 8819763 |
Dynamic access policies |
David Van |
2014-08-26 |
|
| 8721797 |
Enhanced passivation process to protect silicon prior to high dose implant strip |
Haoquan Fang, Jack Kuo, Ilia Kalinovski, Ted Li, Andrew Yao |
2014-05-13 |
|
| 8716143 |
Plasma based photoresist removal system for cleaning post ash residue |
Kirk Ostrowski |
2014-05-06 |
|
| 8641862 |
High dose implantation strip (HDIS) in H2 base chemistry |
Haruhiro Harry Goto |
2014-02-04 |
|
| 8619552 |
Virtual router with a priority value per port |
Xiaohong Pan |
2013-12-31 |
|
| 8591661 |
Low damage photoresist strip method for low-K dielectrics |
Ted Li, Anirban Guha, Kirk Ostrowski |
2013-11-26 |
|
| 8444869 |
Simultaneous front side ash and backside clean |
Haruhiro Harry Goto |
2013-05-21 |
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