Issued Patents All Time
Showing 1–25 of 58 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12302760 | Ion beam etching with sidewall cleaning | Thorsten Lill | 2025-05-13 |
| 12029133 | Ion beam etching with sidewall cleaning | Thorsten Lill | 2024-07-02 |
| 11637022 | Electron excitation atomic layer etch | Thorsten Lill, Andreas Fischer | 2023-04-25 |
| 11520953 | Predicting etch characteristics in thermal etching and atomic layer etching | Thorsten Lill, Andreas Fischer, Nerissa Draeger, Richard A. Gottscho | 2022-12-06 |
| 11289306 | Ion beam etching utilizing cryogenic wafer temperatures | Thorsten Lill, Anthony J. Ricci | 2022-03-29 |
| 11195730 | Method and apparatus for processing wafer-shaped articles | Rainer Obweger, Andreas Gleissner, Thomas Wirnsberger, Franz Kumnig, Alessandro Baldaro +4 more | 2021-12-07 |
| 11062920 | Ion injector and lens system for ion beam milling | Thorsten Lill | 2021-07-13 |
| 10998167 | Ion beam etch without need for wafer tilt or rotation | Thorsten Lill | 2021-05-04 |
| 10825652 | Ion beam etch without need for wafer tilt or rotation | Thorsten Lill | 2020-11-03 |
| 10679868 | Isotropic atomic layer etch for silicon oxides using no activation | Pilyeon Park, Faisal Yaqoob | 2020-06-09 |
| 10580628 | Differentially pumped reactive gas injector | Thorsten Lill, Kenneth R. Reynolds | 2020-03-03 |
| 10490426 | Method and apparatus for processing wafer-shaped articles | Rainer Obweger, Andreas Gleissner, Thomas Wirnsberger, Franz Kumnig, Alessandro Baldaro +4 more | 2019-11-26 |
| 10483085 | Use of ion beam etching to generate gate-all-around structure | Thorsten Lill | 2019-11-19 |
| 10153282 | Ultra-high vacuum transport and storage | Theodoros Panagopoulos, Richard H. Gould, Edmundo Reyes, John D. Boniface, Alexander Dulkin +1 more | 2018-12-11 |
| 9916993 | Ion injector and lens system for ion beam milling | Thorsten Lill | 2018-03-13 |
| 9911620 | Method for achieving ultra-high selectivity while etching silicon nitride | Helen Zhu, Linda Marquez, Faisal Yaqoob, Pilyeon Park, Ivelin Angelov +1 more | 2018-03-06 |
| 9837254 | Differentially pumped reactive gas injector | Thorsten Lill, Kenneth R. Reynolds | 2017-12-05 |
| 9812349 | Control of the incidence angle of an ion beam on a substrate | Ivelin Angelov | 2017-11-07 |
| 9779955 | Ion beam etching utilizing cryogenic wafer temperatures | Thorsten Lill, Anthony J. Ricci | 2017-10-03 |
| 9740104 | Plasma dry strip pretreatment to enhance ion implanted resist removal | Glen F. R. Gilchrist | 2017-08-22 |
| 9543150 | Systems and methods for forming ultra-shallow junctions | Yunsang Kim, YounGi Hong | 2017-01-10 |
| 9536748 | Use of ion beam etching to generate gate-all-around structure | Thorsten Lill | 2017-01-03 |
| 9514954 | Peroxide-vapor treatment for enhancing photoresist-strip performance and modifying organic films | Bayu Thedjoisworo, Bradley Jon Jacobs, David Cheung | 2016-12-06 |
| 9431268 | Isotropic atomic layer etch for silicon and germanium oxides | Thorsten Lill, Meihua Shen, Alan M. Schoepp, David Hemker | 2016-08-30 |
| 9425041 | Isotropic atomic layer etch for silicon oxides using no activation | Pilyeon Park, Faisal Yaqoob | 2016-08-23 |