Issued Patents All Time
Showing 1–23 of 23 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10192751 | Systems and methods for ultrahigh selective nitride etch | Dengliang Yang, Faisal Yaqoob, Pilyeon Park, Joon Hong Park | 2019-01-29 |
| 9911620 | Method for achieving ultra-high selectivity while etching silicon nitride | Linda Marquez, Faisal Yaqoob, Pilyeon Park, Ivan L. Berry, III, Ivelin Angelov +1 more | 2018-03-06 |
| 9837286 | Systems and methods for selectively etching tungsten in a downstream reactor | Dengliang Yang, George Matamis, Brad Jacobs, Joon Hong Park, Joydeep Guha | 2017-12-05 |
| 9558928 | Contact clean in high-aspect ratio structures | Bayu Thedjoisworo, Linda Marquez, Joon Hong Park | 2017-01-31 |
| 7772122 | Sidewall forming processes | Peter Cirigliano, Ji Soo Kim, S. M. Reza Sadjadi | 2010-08-10 |
| 7541475 | Substituted thiazoles | Timothy A. Robbins, Jun Shao | 2009-06-02 |
| 7385287 | Preventing damage to low-k materials during resist stripping | Siyi Li, Howard Dang, Thomas S. Choi, Peter Loewenhardt | 2008-06-10 |
| 7311852 | Method of plasma etching low-k dielectric materials | Si Yi Li, S. M. Reza Sadjadi, James V. Tietz, Bryan A. Helmer | 2007-12-25 |
| 7288488 | Method for resist strip in presence of regular low k and/or porous low k dielectric materials | Reza Sadjadi | 2007-10-30 |
| 7226852 | Preventing damage to low-k materials during resist stripping | Siyi Li, Howard Dang, Thomas S. Choi, Peter Loewenhardt | 2007-06-05 |
| 7202177 | Nitrous oxide stripping process for organosilicate glass | Rao Annapragada | 2007-04-10 |
| 7129171 | Selective oxygen-free etching process for barrier materials | Rao Annapragada | 2006-10-31 |
| 7049052 | Method providing an improved bi-layer photoresist pattern | Hanzhong Xiao, Kuo-Lung Tang, S. M. Reza Sadjadi | 2006-05-23 |
| 6962879 | Method of plasma etching silicon nitride | David R. Pirkle, S. M. Reza Sadjadi, Andrew S. Li | 2005-11-08 |
| 6949460 | Line edge roughness reduction for trench etch | Eric Wagganer, Daniel Le, Peter Loewenhardt | 2005-09-27 |
| 6949469 | Methods and apparatus for the optimization of photo resist etching in a plasma processing system | Yu-Huei Cheng, Vinay V. Phoray, Hanzhong Xiao, Peter Loewenhardt | 2005-09-27 |
| 6916697 | Etch back process using nitrous oxide | Rao Annapragada | 2005-07-12 |
| 6841483 | Unique process chemistry for etching organic low-k materials | James R. Bowers, Ian J. Morey, Wayne Babie, Michael Goss | 2005-01-11 |
| 6670278 | Method of plasma etching of silicon carbide | Si Yi Li, S. M. Reza Sadjadi, David R. Pirkle, James R. Bowers, Michael Goss | 2003-12-30 |
| 6297163 | Method of plasma etching dielectric materials | Roger F. Lindquist | 2001-10-02 |
| 6090304 | Methods for selective plasma etch | George Mueller, Thomas D. Nguyen, Lumin Li | 2000-07-18 |
| 5626716 | Plasma etching of semiconductors | William Frederick Bosch, Syed Haider | 1997-05-06 |
| 5611888 | Plasma etching of semiconductors | William Frederick Bosch, Syed Haider | 1997-03-18 |