Issued Patents All Time
Showing 25 most recent of 26 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9234775 | Methods for verifying gas flow rates from a gas supply system into a plasma processing chamber | Dean J. Larson, Robert C. Hefty, William S. Kennedy, Eric H. Lenz, William M. Denty, Jr. +1 more | 2016-01-12 |
| 8521461 | Apparatus for delivering a process gas | Iqbal Shareef, Vernon Wong, Richard J. Meinecke | 2013-08-27 |
| 8150646 | Methods for delivering a process gas | Iqbal Shareef, Vernon Wong, Richard J. Meinecke | 2012-04-03 |
| 7881886 | Methods for performing transient flow prediction and verification using discharge coefficients | Iqbal Shareef, Vernon Wong, Richard J. Meinecke | 2011-02-01 |
| 7822570 | Methods for performing actual flow verification | Iqbal Shareef, Vernon Wong, Richard J. Meinecke | 2010-10-26 |
| 7311852 | Method of plasma etching low-k dielectric materials | Si Yi Li, Helen Zhu, S. M. Reza Sadjadi, Bryan A. Helmer | 2007-12-25 |
| 7294580 | Method for plasma stripping using periodic modulation of gas chemistry and hydrocarbon addition | Seokmin Yun, Ji Zhu, Peter Cirigliano, Sangheon Lee, Thomas S. Choi +4 more | 2007-11-13 |
| 7166535 | Plasma etching of silicon carbide | Si Yi Li, S. M. Reza Sadjadi | 2007-01-23 |
| 7014538 | Article for polishing semiconductor substrates | Lawrence Rosenberg, Shijian Li, Manoocher Birang, John M. White, Marty Scales +1 more | 2006-03-21 |
| 6916746 | Method for plasma etching using periodic modulation of gas chemistry | Eric A. Hudson | 2005-07-12 |
| 6413873 | System for chemical mechanical planarization | Shijian Li, John M. White, Lawrence Rosenberg, Martin Scales, Ramin Emami +1 more | 2002-07-02 |
| 6302767 | Chemical mechanical polishing with a polishing sheet and a support sheet | — | 2001-10-16 |
| 6273794 | Apparatus and method for grinding a semiconductor wafer surface | John M. White | 2001-08-14 |
| 6157106 | Magnetically-levitated rotor system for an RTP chamber | Benjamin Bierman | 2000-12-05 |
| 6135859 | Chemical mechanical polishing with a polishing sheet and a support sheet | — | 2000-10-24 |
| 6132295 | Apparatus and method for grinding a semiconductor wafer surface | John M. White | 2000-10-17 |
| 6133152 | Co-rotating edge ring extension for use in a semiconductor processing chamber | Benjamin Bierman, Meredith J. Williams, David S. Ballance, Brian Haas, Paul Deaton | 2000-10-17 |
| 6123766 | Method and apparatus for achieving temperature uniformity of a substrate | Meredith J. Williams, David S. Ballance, Benjamin Bierman, Paul Deaton, Brian Haas +1 more | 2000-09-26 |
| 6090210 | Multi-zone gas flow control in a process chamber | David S. Ballance, Benjamin Bierman | 2000-07-18 |
| 6035100 | Reflector cover for a semiconductor processing chamber | Benjamin Bierman, David S. Ballance, Brian Haas, Meredith J. Williams, Paul Deaton | 2000-03-07 |
| 5960555 | Method and apparatus for purging the back side of a substrate during chemical vapor processing | Paul Deaton, Benjamin Bierman, Meredith J. Williams, Brian Haas, David S. Ballance | 1999-10-05 |
| 5920797 | Method for gaseous substrate support | David S. Ballance, Benjamin Bierman, Brian Haas | 1999-07-06 |
| 5884412 | Method and apparatus for purging the back side of a substrate during chemical vapor processing | Benjamin Bierman, David S. Ballance | 1999-03-23 |
| 5879128 | Lift pin and support pin apparatus for a processing chamber | Benjamin Bierman | 1999-03-09 |
| 5848889 | Semiconductor wafer support with graded thermal mass | Benjamin Bierman, David S. Ballance | 1998-12-15 |