Issued Patents All Time
Showing 1–25 of 65 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10410889 | Systems and methods for electrical and magnetic uniformity and skew tuning in plasma processing reactors | Haitao Wang, Jie Zhou, Tza-Jing Gung, Chunlei Zhang, Fernando Silveira | 2019-09-10 |
| 10177050 | Methods and apparatus for controlling substrate uniformity | Dmitry Lubomirsky, Hamid Noorbakhsh, John Zheng Ye, David H. Quach, Sean S. Kang | 2019-01-08 |
| 9412579 | Methods and apparatus for controlling substrate uniformity | Dmitry Lubomirsky, Hamid Noorbakhsh, John Zheng Ye, David H. Quach, Sean S. Kang | 2016-08-09 |
| 9384979 | Apparatus for the deposition of a conformal film on a substrate and methods therefor | Dae-Han Choi, Jisoo Kim, Eric A. Hudson, Sangheon Lee, Conan Chiang | 2016-07-05 |
| 8986492 | Spacer formation for array double patterning | Amit Jain | 2015-03-24 |
| 8911587 | Photoresist double patterning apparatus | Andrew R. Romano | 2014-12-16 |
| 8866202 | Device with gaps for capacitance reduction | Zhi-Song Huang | 2014-10-21 |
| 8864931 | Mask trimming | Supriya Goyal, Dongho Heo, Jisoo Kim | 2014-10-21 |
| 8614149 | Critical dimension reduction and roughness control | Sangheon Lee, Dae-Han Choi, Jisoo Kim, Peter Cirigliano, Zhisong Huang +1 more | 2013-12-24 |
| 8592318 | Pitch reduction using oxide spacer | Jisoo Kim, Conan Chiang, Jun Shinagawa | 2013-11-26 |
| 8361564 | Protective layer for implant photoresist | Andrew R. Romano | 2013-01-29 |
| 8357434 | Apparatus for the deposition of a conformal film on a substrate and methods therefor | Dae-Han Choi, Jisoo Kim, Eric A. Hudson, Sangheon Lee, Conan Chiang | 2013-01-22 |
| 8343876 | Fast gas switching plasma processing apparatus | Zhisong Huang, Jose Tong Sam, Eric H. Lenz, Rajinder Dhindsa | 2013-01-01 |
| 8282847 | Photoresist double patterning | Andrew R. Romano | 2012-10-09 |
| 8268118 | Critical dimension reduction and roughness control | Sangheon Lee, Dae-Han Choi, Jisoo Kim, Peter Cirigliano, Zhisong Huang +1 more | 2012-09-18 |
| 8262920 | Minimization of mask undercut on deep silicon etch | Tamarak Pandhumsoporn, Patrick Chung, Jackie Seto | 2012-09-11 |
| 8187412 | Apparatus for providing device with gaps for capacitance reduction | Zhi-Song Huang | 2012-05-29 |
| 8172980 | Device with self aligned gaps for capacitance reduction | Zhi-Song Huang | 2012-05-08 |
| 8172948 | De-fluoridation process | Dongho Heo, Jisoo Kim | 2012-05-08 |
| 8138092 | Spacer formation for array double patterning | Amit Jain | 2012-03-20 |
| 7977242 | Double mask self-aligned double patterning technology (SADPT) process | Lumin Li, Andrew R. Romano | 2011-07-12 |
| 7910489 | Infinitely selective photoresist mask etch | Ji Soo Kim, Peter Cirigliano, Sangheon Lee, Dongho Heo, Daehan Choi | 2011-03-22 |
| 7902073 | Glue layer for hydrofluorocarbon etch | Ji Soo Kim, Sangheon Lee, Deepak Gupta | 2011-03-08 |
| 7785484 | Mask trimming with ARL etch | Dongho Heo, Supriya Goyal, Jisoo Kim | 2010-08-31 |
| 7772122 | Sidewall forming processes | Peter Cirigliano, Helen Zhu, Ji Soo Kim | 2010-08-10 |