Issued Patents All Time
Showing 1–25 of 78 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12203168 | Metal deposition | Ravi Vellanki, Vinayakaraddy Gulabal, Sanjay Gopinath, Michal Danek, Prodyut Majumder +5 more | 2025-01-21 |
| 10186448 | Wafer support pedestal with wafer anti-slip and anti-rotation features | Peter Krotov | 2019-01-22 |
| 10087523 | Vapor delivery method and apparatus for solid and liquid precursors | Joshua Collins, Michal Danek | 2018-10-02 |
| 9951423 | Systems and methods for measuring entrained vapor | — | 2018-04-24 |
| 9694453 | Method and apparatus for physical confinement of a liquid meniscus over a semiconductor wafer | Enrico Magni | 2017-07-04 |
| 9321000 | Airflow management for low particulate count in a process tool | — | 2016-04-26 |
| 9234775 | Methods for verifying gas flow rates from a gas supply system into a plasma processing chamber | Dean J. Larson, Robert C. Hefty, James V. Tietz, William S. Kennedy, William M. Denty, Jr. +1 more | 2016-01-12 |
| 9117870 | High throughput cleaner chamber | — | 2015-08-25 |
| 9111724 | Apparatus and method for controlling plasma potential | Douglas Keil, Lumin Li, Reza Sadjadi, Eric A. Hudson, Rajinder Dhindsa | 2015-08-18 |
| 8997684 | Prevention of particle adders when contacting a liquid meniscus over a substrate | Enrico Magni, Suresh Gupta, Mark Gahagan, Mike Ravkin | 2015-04-07 |
| 8893642 | Airflow management for low particulate count in a process tool | — | 2014-11-25 |
| 8846539 | Apparatus including showerhead electrode and heater for plasma processing | Rajinder Dhindsa | 2014-09-30 |
| 8822345 | Apparatus including gas distribution member supplying process gas and radio frequency (RF) power for plasma processing | Rajinder Dhindsa | 2014-09-02 |
| 8813764 | Method and apparatus for physical confinement of a liquid meniscus over a semiconductor wafer | Enrico Magni | 2014-08-26 |
| 8789493 | Sealed elastomer bonded Si electrodes and the like for reduced particle contamination in dielectric etch | Daxing Ren, Enrico Magni, Ren Zhou | 2014-07-29 |
| 8703249 | Techniques for reducing arcing-related damage in a clamping ring of a plasma processing system | Jose Tong | 2014-04-22 |
| 8674255 | Apparatus and method for controlling etch uniformity | Raj Dhindsa, Dave Trussell, Lumin Li | 2014-03-18 |
| 8673785 | Gas distribution system having fast gas switching capabilities | Zhisong Huang, Jose Tong Sam, Rajinder Dhindsa, Reza Sadjadi | 2014-03-18 |
| 8580045 | Method and apparatus for physical confinement of a liquid meniscus over a semiconductor wafer | Enrico Magni | 2013-11-12 |
| 8562272 | Substrate load and unload mechanisms for high throughput | — | 2013-10-22 |
| 8534303 | Carrier for reducing entrance and/or exit marks left by a substrate-processing meniscus | Robert O'Donnell, Mark Wilcoxson, Mike Ravkin, Alexander A. Yatskar | 2013-09-17 |
| 8464736 | Reclaim chemistry | — | 2013-06-18 |
| 8343876 | Fast gas switching plasma processing apparatus | S. M. Reza Sadjadi, Zhisong Huang, Jose Tong Sam, Rajinder Dhindsa | 2013-01-01 |
| 8317968 | Apparatus including gas distribution member supplying process gas and radio frequency (RF) power for plasma processing | Rajinder Dhindsa | 2012-11-27 |
| 8282698 | Reduction of particle contamination produced by moving mechanisms in a process tool | — | 2012-10-09 |