Issued Patents All Time
Showing 1–11 of 11 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9945736 | Methods and apparatus for in situ substrate temperature monitoring by electromagnetic radiation emission | — | 2018-04-17 |
| 9694453 | Method and apparatus for physical confinement of a liquid meniscus over a semiconductor wafer | Eric H. Lenz | 2017-07-04 |
| 9234775 | Methods for verifying gas flow rates from a gas supply system into a plasma processing chamber | Dean J. Larson, Robert C. Hefty, James V. Tietz, William S. Kennedy, Eric H. Lenz +1 more | 2016-01-12 |
| 8997684 | Prevention of particle adders when contacting a liquid meniscus over a substrate | Suresh Gupta, Mark Gahagan, Eric H. Lenz, Mike Ravkin | 2015-04-07 |
| 8813764 | Method and apparatus for physical confinement of a liquid meniscus over a semiconductor wafer | Eric H. Lenz | 2014-08-26 |
| 8789493 | Sealed elastomer bonded Si electrodes and the like for reduced particle contamination in dielectric etch | Daxing Ren, Eric H. Lenz, Ren Zhou | 2014-07-29 |
| 8580045 | Method and apparatus for physical confinement of a liquid meniscus over a semiconductor wafer | Eric H. Lenz | 2013-11-12 |
| 7442114 | Methods for silicon electrode assembly etch rate and etch uniformity recovery | Tuochuan Huang, Daxing Ren, Hong Shih, Catherine Zhou, Chun Yan +4 more | 2008-10-28 |
| 7341673 | Methods and apparatus for in situ substrate temperature monitoring by electromagnetic radiation emission | — | 2008-03-11 |
| 7291286 | Methods for removing black silicon and black silicon carbide from surfaces of silicon and silicon carbide electrodes for plasma processing apparatuses | Michael J. Kelly, Robert C. Hefty, Michelle Lupan | 2007-11-06 |
| 7226869 | Methods for protecting silicon or silicon carbide electrode surfaces from morphological modification during plasma etch processing | Kenji Takeshita, Tsuyoshi Aso, Seiji Kawaguchi, Thomas McClard, Wan-Lin Chen +3 more | 2007-06-05 |