WK

William S. Kennedy

Lam Research: 26 patents #90 of 2,128Top 5%
WI Western Atlas International: 3 patents #49 of 314Top 20%
Alcatel Lucent: 1 patents #594 of 1,504Top 40%
Overall (All Time): #108,271 of 4,157,543Top 3%
33
Patents All Time

Issued Patents All Time

Showing 25 most recent of 33 patents

Patent #TitleCo-InventorsDate
9614677 Secure function evaluation of tree circuits Gordon Wilfong, Vladimir Kolesnikov 2017-04-04
9234775 Methods for verifying gas flow rates from a gas supply system into a plasma processing chamber Dean J. Larson, Robert C. Hefty, James V. Tietz, Eric H. Lenz, William M. Denty, Jr. +1 more 2016-01-12
9053925 Configurable bevel etcher Andrew D. Bailey, III, Alan M. Schoepp, Gregory Sexton, Yunsang Kim 2015-06-09
8721908 Bevel etcher with vacuum chuck Andrew D. Bailey, III, Alan M. Schoepp, Gregory Sexton 2014-05-13
8580078 Bevel etcher with vacuum chuck Andrew D. Bailey, III, Alan M. Schoepp, Gregory Sexton 2013-11-12
8573153 Multi-part electrode for a semiconductor processing plasma reactor and method of replacing a portion of a multi-part electrode Andreas Fischer, Peter Loewenhardt, David Trussell 2013-11-05
8080107 Showerhead electrode assembly for plasma processing apparatuses David Jacob 2011-12-20
7943007 Configurable bevel etcher Andrew D. Bailey, III, Alan M. Schoepp, Gregory Sexton, Yunsang Kim 2011-05-17
7861667 Multi-part electrode for a semiconductor processing plasma reactor and method of replacing a portion of a multi-part electrode Andreas Fischer, Peter Loewenhardt, David Trussell 2011-01-04
7858898 Bevel etcher with gap control Andrew D. Bailey, III, Alan M. Schoepp, Gregory Sexton, Andras Kuthi, Yunsang Kim 2010-12-28
7827657 Method of making an electrode assembly for plasma processing apparatus David Jacob 2010-11-09
7645341 Showerhead electrode assembly for plasma processing apparatuses David Jacob 2010-01-12
7543547 Electrode assembly for plasma processing apparatus David Jacob 2009-06-09
6583064 Low contamination high density plasma etch chambers and methods for making the same Thomas E. Wicker, Robert A. Maraschin 2003-06-24
6408786 Semiconductor processing equipment having tiled ceramic liner Robert A. Maraschin, Jerome S. Hubacek 2002-06-25
6394026 Low contamination high density plasma etch chambers and methods for making the same Thomas E. Wicker, Robert A. Maraschin 2002-05-28
6376385 Method of manufacturing assembly for plasma reaction chamber and use thereof John Lilleland, Jerome S. Hubacek 2002-04-23
6306244 Apparatus for reducing polymer deposition on substrate support Thomas E. Wicker, Robert A. Maraschin, Joel M. Cook, Alan M. Schoepp 2001-10-23
6227140 Semiconductor processing equipment having radiant heated ceramic liner Robert A. Maraschin, Thomas E. Wicker 2001-05-08
6194322 Electrode for plasma processes and method for a manufacture and use thereof John Lilleland, Jerome S. Hubacek 2001-02-27
6155203 Apparatus for control of deposit build-up on an inner surface of a plasma processing chamber Albert Lamm, Thomas E. Wicker, Robert A. Maraschin 2000-12-05
6148765 Electrode for plasma processes and method for manufacture and use thereof John Lilleland, Jerome S. Hubacek 2000-11-21
6129808 Low contamination high density plasma etch chambers and methods for making the same Thomas E. Wicker, Robert A. Maraschin 2000-10-10
6073577 Electrode for plasma processes and method for manufacture and use thereof John Lilleland, Jerome S. Hubacek 2000-06-13
6063234 Temperature sensing system for use in a radio frequency environment Jian J. Chen 2000-05-16