| 7096819 |
Inductive plasma processor having coil with plural windings and method of controlling plasma density |
Jian J. Chen, Robert Veltrop |
2006-08-29 |
$14,349,000 |
| 6881608 |
Semiconductor processing equipment having improved process drift control |
— |
2005-04-19 |
$37,257,000 |
| 6673198 |
Semiconductor processing equipment having improved process drift control |
— |
2004-01-06 |
$47,614,000 |
| 6583064 |
Low contamination high density plasma etch chambers and methods for making the same |
Robert A. Maraschin, William S. Kennedy |
2003-06-24 |
$12,299,000 |
| 6583572 |
Inductive plasma processor including current sensor for plasma excitation coil |
Robert Veltrop, Jian J. Chen |
2003-06-24 |
$12,299,000 |
| 6527912 |
Stacked RF excitation coil for inductive plasma processor |
Jian J. Chen, Robert Veltrop |
2003-03-04 |
$4,992,000 |
| 6463875 |
Multiple coil antenna for inductively-coupled plasma generation systems |
Jian J. Chen, Robert Veltrop |
2002-10-15 |
$3,906,000 |
| 6464843 |
Contamination controlling method and apparatus for a plasma processing chamber |
Alan M. Schoepp, Robert A. Maraschin |
2002-10-15 |
$3,906,000 |
| 6394026 |
Low contamination high density plasma etch chambers and methods for making the same |
Robert A. Maraschin, William S. Kennedy |
2002-05-28 |
$38,948,000 |
| 6306244 |
Apparatus for reducing polymer deposition on substrate support |
William S. Kennedy, Robert A. Maraschin, Joel M. Cook, Alan M. Schoepp |
2001-10-23 |
$9,139,000 |
| 6251793 |
Particle controlling method for a plasma processing chamber |
Robert A. Maraschin |
2001-06-26 |
$70,724,000 |
| 6227140 |
Semiconductor processing equipment having radiant heated ceramic liner |
William S. Kennedy, Robert A. Maraschin |
2001-05-08 |
$18,186,000 |
| 6164241 |
Multiple coil antenna for inductively-coupled plasma generation systems |
Jian J. Chen, Robert Veltrop |
2000-12-26 |
$12,327,000 |
| 6155199 |
Parallel-antenna transformer-coupled plasma generation system |
Jian J. Chen, Robert Veltrop |
2000-12-05 |
$19,413,000 |
| 6155203 |
Apparatus for control of deposit build-up on an inner surface of a plasma processing chamber |
William S. Kennedy, Albert Lamm, Robert A. Maraschin |
2000-12-05 |
$19,413,000 |
| 6129808 |
Low contamination high density plasma etch chambers and methods for making the same |
Robert A. Maraschin, William S. Kennedy |
2000-10-10 |
$48,860,000 |
| 6035868 |
Method and apparatus for control of deposit build-up on an inner surface of a plasma processing chamber |
William S. Kennedy, Albert Lamm, Robert A. Maraschin |
2000-03-14 |
$91,109,000 |
| 6033585 |
Method and apparatus for preventing lightup of gas distribution holes |
Albert Lamm, Vahid Vahedi |
2000-03-07 |
$107,441,000 |
| 6028286 |
Method for igniting a plasma inside a plasma processing reactor |
Joel M. Cook, Jian J. Chen |
2000-02-22 |
$24,217,000 |
| 5993594 |
Particle controlling method and apparatus for a plasma processing chamber |
Robert A. Maraschin |
1999-11-30 |
$32,165,000 |
| 5863376 |
Temperature controlling method and apparatus for a plasma processing chamber |
Joel M. Cook, Robert A. Maraschin, William S. Kennedy, Neil Benjamin |
1999-01-26 |
$22,619,000 |
| 5543184 |
Method of reducing particulates in a plasma tool through steady state flows |
Michael Barnes, Dennis K. Coultas, John C. Forster, John H. Keller |
1996-08-06 |
|
| 5518547 |
Method and apparatus for reducing particulates in a plasma tool through steady state flows |
Michael Barnes, Dennis K. Coultas, John C. Forster, John H. Keller |
1996-05-21 |
$11,195,000 |
| 4724510 |
Electrostatic wafer clamp |
Roger B. Lachenbruch |
1988-02-09 |
|
