Issued Patents All Time
Showing 25 most recent of 43 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12198896 | Compact high density plasma source | Roger Patrick, Neil Benjamin, Lee Chen, Clint Thomas, Thomas W. Anderson +1 more | 2025-01-14 |
| 11984330 | Atomic layer etch and deposition processing systems including a lens circuit with a tele-centric lens, an optical beam folding assembly, or a polygon scanner | Dong Woo Paeng, Yunsang Kim, He Zhang, Keith Wells | 2024-05-14 |
| 10808317 | Deposition apparatus including an isothermal processing zone | Ramesh Chandrasekharan, Jeremy Tucker, Karl Leeser | 2020-10-20 |
| 10107490 | Configurable liquid precursor vaporizer | Colin F. Smith, Harald te Nijenhuis, Jeffrey E. Lorelli, Edward Sung, Kevin Madrigal +1 more | 2018-10-23 |
| 9982341 | Modular vaporizer | Colin F. Smith, Edward Sung | 2018-05-29 |
| 9673037 | Substrate freeze dry apparatus and method | Stephen M. Sirard, Diane Hymes | 2017-06-06 |
| 9431268 | Isotropic atomic layer etch for silicon and germanium oxides | Thorsten Lill, Ivan L. Berry, III, Meihua Shen, David Hemker | 2016-08-30 |
| 9287110 | Method and apparatus for wafer electroless plating | William Thie, John M. Boyd, Fritz Redeker, Yezdi Dordi, John Parks +5 more | 2016-03-15 |
| 9117860 | Controlled ambient system for interface engineering | John M. Boyd, Yezdi Dordi, Tiruchirapalli Arunagiri, Benjamin W. Mooring, John Parks +7 more | 2015-08-25 |
| 9053925 | Configurable bevel etcher | Andrew D. Bailey, III, Gregory Sexton, Yunsang Kim, William S. Kennedy | 2015-06-09 |
| 8940098 | Method for distributing gas for a bevel etcher | Greg Sexton, Andrew D. Bailey, III | 2015-01-27 |
| 8898928 | Delamination drying apparatus and method | Stephen M. Sirard, Diane Hymes, Ratchana Limary | 2014-12-02 |
| 8844461 | Fluid handling system for wafer electroless plating and associated methods | William Thie, John M. Boyd, Fritz Redeker, Yezdi Dordi, John Parks +5 more | 2014-09-30 |
| 8721908 | Bevel etcher with vacuum chuck | Andrew D. Bailey, III, Gregory Sexton, William S. Kennedy | 2014-05-13 |
| 8580078 | Bevel etcher with vacuum chuck | Andrew D. Bailey, III, Gregory Sexton, William S. Kennedy | 2013-11-12 |
| 8485120 | Method and apparatus for wafer electroless plating | William Thie, John M. Boyd, Fritz Redeker, Yezdi Dordi, John Parks +5 more | 2013-07-16 |
| 8398875 | Method of orienting an upper electrode relative to a lower electrode for bevel edge processing | Gregory Sexton, Andrew D. Bailey, III, John D. Boniface | 2013-03-19 |
| 8314027 | Wafer electroless plating system and associated methods | William Thie, John M. Boyd, Fritz Redeker, Yezdi Dordi, John Parks +5 more | 2012-11-20 |
| 8083207 | Apparatus for gate valve movement in a minimum-space wet process environment | Jacob Wylie, Gregory A. Clemmer | 2011-12-27 |
| 8069813 | Wafer electroless plating system and associated methods | William Thie, John M. Boyd, Fritz Redeker, Yezdi Dordi, John Parks +5 more | 2011-12-06 |
| 7943007 | Configurable bevel etcher | Andrew D. Bailey, III, Gregory Sexton, Yunsang Kim, William S. Kennedy | 2011-05-17 |
| 7922866 | Apparatus for aligning electrodes in a process chamber to protect an exclusion area within an edge environ of a wafer | Gregory Sexton, Andrew D. Bailey, III, John D. Boniface | 2011-04-12 |
| 7858898 | Bevel etcher with gap control | Andrew D. Bailey, III, Gregory Sexton, Andras Kuthi, Yunsang Kim, William S. Kennedy | 2010-12-28 |
| 7662254 | Methods of and apparatus for aligning electrodes in a process chamber to protect an exclusion area within an edge environ of a wafer | Gregory Sexton, Andrew D. Bailey, III, John D. Boniface | 2010-02-16 |
| 7625452 | Apparatuses and methods for cleaning a substrate | John M. de Larios, Aleksander Owczarz, Fritz Redeker | 2009-12-01 |