Issued Patents All Time
Showing 1–25 of 61 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11984330 | Atomic layer etch and deposition processing systems including a lens circuit with a tele-centric lens, an optical beam folding assembly, or a polygon scanner | Dong Woo Paeng, He Zhang, Keith Wells, Alan M. Schoepp | 2024-05-14 |
| 11977252 | Display device including a light guide plate with protrusions | Yongkun Kim | 2024-05-07 |
| 11640025 | Display device having a private mode and a sharing mode | Yongkun Kim | 2023-05-02 |
| 10832923 | Lower plasma-exclusion-zone rings for a bevel etcher | Tong Fang, Keechan Kim, George Stojakovic | 2020-11-10 |
| 10811282 | Upper plasma-exclusion-zone rings for a bevel etcher | Tong Fang, Keechan Kim, George Stojakovic | 2020-10-20 |
| 10770297 | Method to form ultrashallow junctions using atomic layer deposition and annealing | Edmund Burte, Bodo Kalkofen | 2020-09-08 |
| 10748747 | Edge exclusion control with adjustable plasma exclusion zone ring | Keechan Kim | 2020-08-18 |
| 10714345 | Plasma assisted doping on germanium | Hyuk-Jun Kwon | 2020-07-14 |
| 10629458 | Control of bevel etch film profile using plasma exclusion zone rings larger than the wafer diameter | Tong Fang, Keechan Kim, George Stojakovic | 2020-04-21 |
| 10522354 | Antimony co-doping with phosphorus to form ultrashallow junctions using atomic layer deposition and annealing | Edmund Burte, Bodo Kalkofen | 2019-12-31 |
| 10431462 | Plasma assisted doping on germanium | Hyuk-Jun Kwon | 2019-10-01 |
| 10224212 | Isotropic etching of film with atomic layer control | Hyuk-Jun Kwon, Dong Woo Paeng, He Zhang | 2019-03-05 |
| 10217610 | Arrangements for manipulating plasma confinement within a plasma processing system and methods thereof | Eller Y. Juco, Neungho Shin, Andrew D. Bailey, III | 2019-02-26 |
| 10068981 | Rare earth metal surface-activated plasma doping on semiconductor substrates | Reza Arghavani | 2018-09-04 |
| 9881788 | Back side deposition apparatus and applications | Kaushik Chattopadhyay, Gregory Sexton, Youn Gi Hong | 2018-01-30 |
| 9564308 | Methods for processing bevel edge etching | Gregory Sexton, Andrew D. Bailey, III, Andras Kuthi | 2017-02-07 |
| 9543150 | Systems and methods for forming ultra-shallow junctions | YounGi Hong, Ivan L. Berry, III | 2017-01-10 |
| 9281166 | Plasma processing chamber for bevel edge processing | Andrew D. Bailey, III | 2016-03-08 |
| 9275838 | Arrangements for manipulating plasma confinement within a plasma processing system and methods thereof | Eller Y. Juco, Neungho Shin, Andrew D. Bailey, III | 2016-03-01 |
| 9184043 | Edge electrodes with dielectric covers | Gregory Sexton, Andrew D. Bailey, III, Andras Kuthi | 2015-11-10 |
| 9053925 | Configurable bevel etcher | Andrew D. Bailey, III, Alan M. Schoepp, Gregory Sexton, William S. Kennedy | 2015-06-09 |
| 8852384 | Method and apparatus for detecting plasma unconfinement | Keechan Kim, Andrew D. Bailey, III | 2014-10-07 |
| 8673111 | Plasma processing chamber for bevel edge processing | Andrew D. Bailey, III | 2014-03-18 |
| 8562750 | Method and apparatus for processing bevel edge | Jack Chen | 2013-10-22 |
| 8500951 | Low-K damage avoidance during bevel etch processing | Andrew D. Bailey, III, Jack Chen | 2013-08-06 |