| 12387915 |
Lower plasma exclusion zone ring for bevel etcher |
Jack Chen, Gregory Sexton |
2025-08-12 |
| 10832923 |
Lower plasma-exclusion-zone rings for a bevel etcher |
Tong Fang, Yunsang Kim, George Stojakovic |
2020-11-10 |
| 10811282 |
Upper plasma-exclusion-zone rings for a bevel etcher |
Tong Fang, Yunsang Kim, George Stojakovic |
2020-10-20 |
| 10748747 |
Edge exclusion control with adjustable plasma exclusion zone ring |
Yunsang Kim |
2020-08-18 |
| 10629458 |
Control of bevel etch film profile using plasma exclusion zone rings larger than the wafer diameter |
Tong Fang, Yunsang Kim, George Stojakovic |
2020-04-21 |
| 9799496 |
Edge exclusion control with adjustable plasma exclusion zone ring |
Yansung Kim |
2017-10-24 |
| 9184030 |
Edge exclusion control with adjustable plasma exclusion zone ring |
Yansung Kim |
2015-11-10 |
| 8852384 |
Method and apparatus for detecting plasma unconfinement |
Yunsang Kim, Andrew D. Bailey, III |
2014-10-07 |
| 8398778 |
Control of bevel etch film profile using plasma exclusion zone rings larger than the wafer diameter |
Tong Fang, Yunsang Kim, George Stojakovic |
2013-03-19 |
| 8257503 |
Method and apparatus for detecting plasma unconfinement |
Yunsang Kim, Andrew D. Bailey, III |
2012-09-04 |
| 8137501 |
Bevel clean device |
Yunsang Kim, Andrew D. Bailey, III, Greg Sexton, Andras Kuthi |
2012-03-20 |
