Issued Patents All Time
Showing 25 most recent of 135 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11704463 | Method of etch model calibration using optical scatterometry | Ye Feng, Marcus Musselman, Mehmet Derya Tetiker, Saravanapriyan Sriraman, Yan Zhang +1 more | 2023-07-18 |
| 11670486 | Pulsed plasma chamber in dual chamber configuration | Alexei Marakhtanov, Rajinder Dhindsa, Eric A. Hudson | 2023-06-06 |
| 11594400 | Multi zone gas injection upper electrode system | Ryan Bise, Rajinder Dhindsa, Alexei Marakhtanov, Lumin Li, Sang Ki Nam +6 more | 2023-02-28 |
| 11056322 | Method and apparatus for determining process rate | Yassine Kabouzi, Luc Albarede, Jorge Luque, Seonkyung Lee, Thorsten Lill | 2021-07-06 |
| 11029668 | Systems and methods for calibrating scalar field contribution values for a limited number of sensors including a temperature value of an electrostatic chuck and estimating temperature distribution profiles based on calibrated values | Marcus Musselman | 2021-06-08 |
| 11011353 | Systems and methods for performing edge ring characterization | Marcus Musselman, Jon McChesney | 2021-05-18 |
| 10997345 | Method of etch model calibration using optical scatterometry | Ye Feng, Marcus Musselman, Mehmet Derya Tetiker, Saravanapriyan Sriraman, Yan Zhang +1 more | 2021-05-04 |
| 10847430 | Method of feature exaction from time-series of spectra to control endpoint of process | Ye Feng, Prashanth Kumar | 2020-11-24 |
| 10763142 | System and method for determining field non-uniformities of a wafer processing chamber using a wafer processing parameter | Marcus Musselman, Juan Valdivia, Hua Xiang, Yoko Yamaguchi, Qian Fu +1 more | 2020-09-01 |
| 10622195 | Multi zone gas injection upper electrode system | Ryan Bise, Rajinder Dhindsa, Alexei Marakhtanov, Lumin Li, Sang Ki Nam +6 more | 2020-04-14 |
| 10585347 | Photoresist design layout pattern proximity correction through fast edge placement error prediction via a physics-based etch profile modeling framework | Saravanapriyan Sriraman, Richard Wise, Harmeet Singh, Alex Paterson, Vahid Vahedi +1 more | 2020-03-10 |
| 10572697 | Method of etch model calibration using optical scatterometry | Ye Feng, Marcus Musselman, Mehmet Derya Tetiker, Saravanapriyan Sriraman, Yan Zhang +1 more | 2020-02-25 |
| 10553399 | Pulsed plasma chamber in dual chamber configuration | Alexei Marakhtanov, Rajinder Dhindsa, Eric A. Hudson | 2020-02-04 |
| 10534257 | Layout pattern proximity correction through edge placement error prediction | Mehmet Derya Tetiker, Saravanapriyan Sriraman, Richard Wise | 2020-01-14 |
| 10504704 | Plasma etching systems and methods using empirical mode decomposition | Luc Albarede, Yassine Kabouzi, Jorge Luque | 2019-12-10 |
| 10386828 | Methods and apparatuses for etch profile matching by surface kinetic model optimization | Mehmet Derya Tetiker, Saravanapriyan Sriraman, Juline Shoeb, Alex Paterson, Richard A. Gottscho | 2019-08-20 |
| 10386821 | Systems and methods for calibrating scalar field contribution values for a limited number of sensors including a temperature value of an electrostatic chuck and estimating temperature distribution profiles based on calibrated values | Marcus Musselman | 2019-08-20 |
| 10312121 | Systems and methods for aligning measurement device in substrate processing systems | Marcus Musselman, Dmitry Opaits | 2019-06-04 |
| 10303830 | Methods and apparatuses for etch profile optimization by reflectance spectra matching and surface kinetic model optimization | Mehmet Derya Tetiker, Saravanapriyan Sriraman, Alex Paterson, Richard A. Gottscho | 2019-05-28 |
| 10262910 | Method of feature exaction from time-series of spectra to control endpoint of process | Ye Feng, Prashanth Kumar | 2019-04-16 |
| 10242849 | System and method for detecting a process point in multi-mode pulse processes | Yassine Kabouzi, Jorge Luque, Mehmet Derya Tetiker, Ramkumar Subramanian, Yoko Yamaguchi | 2019-03-26 |
| 10217610 | Arrangements for manipulating plasma confinement within a plasma processing system and methods thereof | Eller Y. Juco, Neungho Shin, Yunsang Kim | 2019-02-26 |
| 10197908 | Photoresist design layout pattern proximity correction through fast edge placement error prediction via a physics-based etch profile modeling framework | Saravanapriyan Sriraman, Richard Wise, Harmeet Singh, Alex Paterson, Vahid Vahedi +1 more | 2019-02-05 |
| 10181412 | Negative ion control for dielectric etch | Alexei Marakhtanov, Mirzafer Abatchev, Rajinder Dhindsa, Eric A. Hudson | 2019-01-15 |
| 10032681 | Etch metric sensitivity for endpoint detection | Mehmet Derya Tetiker, Duncan W. Mills | 2018-07-24 |