Issued Patents All Time
Showing 26–50 of 135 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9996647 | Methods and apparatuses for etch profile optimization by reflectance spectra matching and surface kinetic model optimization | Mehmet Derya Tetiker, Saravanapriyan Sriraman, Alex Paterson, Richard A. Gottscho | 2018-06-12 |
| 9941178 | Methods for detecting endpoint for through-silicon via reveal applications | Alan J. Miller, Evelio Sevillano, Jorge Luque, Qing Xu | 2018-04-10 |
| 9864361 | Flexible temperature compensation systems and methods for substrate processing systems | Marcus Carbery | 2018-01-09 |
| 9818633 | Equipment front end module for transferring wafers and method of transferring wafers | Thorsten Lill, Vahid Vahedi, Candi Kristoffersen, Meihua Shen, Rangesh Raghavan +1 more | 2017-11-14 |
| 9792393 | Methods and apparatuses for etch profile optimization by reflectance spectra matching and surface kinetic model optimization | Mehmet Derya Tetiker, Saravanapriyan Sriraman, Alex Paterson, Richard A. Gottscho | 2017-10-17 |
| 9793128 | Plasma processing chamber with dual axial gas injection and exhaust | Rajinder Dhindsa, Alexei Marakhtanov | 2017-10-17 |
| 9735069 | Method and apparatus for determining process rate | Yassine Kabouzi, Luc Albarede, Jorge Luque, Seonkyung Lee, Thorsten Lill | 2017-08-15 |
| 9721782 | Method and apparatus for shaping a gas profile near bevel edge | Jack Chen, Iqbal Shareef | 2017-08-01 |
| 9640371 | System and method for detecting a process point in multi-mode pulse processes | Yassine Kabouzi, Jorge Luque, Mehmet Derya Tetiker, Ramkumar Subramanian, Yoko Yamaguchi | 2017-05-02 |
| 9564308 | Methods for processing bevel edge etching | Gregory Sexton, Andras Kuthi, Yunsang Kim | 2017-02-07 |
| 9548189 | Plasma etching systems and methods using empirical mode decomposition | Luc Albarede, Yassine Kabouzi, Jorge Luque | 2017-01-17 |
| 9543225 | Systems and methods for detecting endpoint for through-silicon via reveal applications | Alan J. Miller, Evelio Sevillano, Jorge Luque, Qing Xu | 2017-01-10 |
| 9418859 | Plasma-enhanced etching in an augmented plasma processing system | Eric A. Hudson, Rajinder Dhindsa | 2016-08-16 |
| 9281166 | Plasma processing chamber for bevel edge processing | Yunsang Kim | 2016-03-08 |
| 9275838 | Arrangements for manipulating plasma confinement within a plasma processing system and methods thereof | Eller Y. Juco, Neungho Shin, Yunsang Kim | 2016-03-01 |
| 9263240 | Dual zone temperature control of upper electrodes | Alexei Marakhtanov, Rajinder Dhindsa, Ryan Bise, Lumin Li, Sang Ki Nam +5 more | 2016-02-16 |
| 9184043 | Edge electrodes with dielectric covers | Gregory Sexton, Andras Kuthi, Yunsang Kim | 2015-11-10 |
| 9184028 | Dual plasma volume processing apparatus for neutral/ion flux control | Rajinder Dhindsa, Alexei Marakhatnov | 2015-11-10 |
| 9123582 | Methods of in-situ measurements of wafer bow | — | 2015-09-01 |
| 9117767 | Negative ion control for dielectric etch | Alexei Marakhatanov, Mirzafer Abatchev, Rajinder Dhindsa, Eric A. Hudson | 2015-08-25 |
| 9053925 | Configurable bevel etcher | Alan M. Schoepp, Gregory Sexton, Yunsang Kim, William S. Kennedy | 2015-06-09 |
| 9039911 | Plasma-enhanced etching in an augmented plasma processing system | Eric A. Hudson, Rajinder Dhindsa | 2015-05-26 |
| 8940098 | Method for distributing gas for a bevel etcher | Greg Sexton, Alan M. Schoepp | 2015-01-27 |
| 8926789 | Apparatus for the removal of a fluorinated polymer from a substrate | Hyungsuk Alexander Yoon, John M. Boyd, Andras Kuthi | 2015-01-06 |
| 8900398 | Local plasma confinement and pressure control arrangement and methods thereof | Rajinder Dhindsa, Michael C. Kellogg, Babak Kadkhodayan | 2014-12-02 |