Issued Patents All Time
Showing 1–22 of 22 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11112773 | Systems for removing and replacing consumable parts from a semiconductor process module in situ | David Trussell, John Daugherty, Alex Paterson | 2021-09-07 |
| 11041227 | Process for recovering gold from ores | Keren Larmour-Ship, Tal Fabian, Sharon Krumbein Rubin, Elizabeta Shandalov, Mira Bergstein Freiberg | 2021-06-22 |
| 9941178 | Methods for detecting endpoint for through-silicon via reveal applications | Evelio Sevillano, Jorge Luque, Andrew D. Bailey, III, Qing Xu | 2018-04-10 |
| 9543225 | Systems and methods for detecting endpoint for through-silicon via reveal applications | Evelio Sevillano, Jorge Luque, Andrew D. Bailey, III, Qing Xu | 2017-01-10 |
| 8871105 | Method for achieving smooth side walls after Bosch etch process | Jaroslaw W. Winniczek, Frank Y. Lin, Qing Xu, Seongjun Heo, Jin-Hwan Ham +2 more | 2014-10-28 |
| 8609548 | Method for providing high etch rate | Qing Xu, Camelia Rusu, Jaroslaw W. Winniczek, Frank Y. Lin | 2013-12-17 |
| 7682980 | Method to improve profile control and N/P loading in dual doped gate applications | Helene Del Puppo, Frank Y. Lin, Chris Lee, Vahid Vahedi, Thomas A. Kamp +2 more | 2010-03-23 |
| 7667281 | Method for hard mask CD trim | C. Robert Koemtzopoulos, Shibu Gangadharan, Chris Lee | 2010-02-23 |
| 7605063 | Photoresist stripping chamber and methods of etching photoresist on substrates | Robert Chebi, Jaroslaw W. Winniczek, Gladys Lo | 2009-10-20 |
| 7425277 | Method for hard mask CD trim | C. Robert Koemtzopoulos, Shibu Gangadharan, Chris Lee | 2008-09-16 |
| 7316785 | Methods and apparatus for the optimization of etch resistance in a plasma processing system | Yoko Y. Adams, George Stojakovic | 2008-01-08 |
| 7204934 | Method for planarization etch with in-situ monitoring by interferometry prior to recess etch | Linda Braly, Vahid Vahedi, Erik A. Edelberg | 2007-04-17 |
| 7186661 | Method to improve profile control and N/P loading in dual doped gate applications | Helene Del Puppo, Frank Y. Lin, Chris Lee, Vahid Vahedi, Thomas A. Kamp +2 more | 2007-03-06 |
| 7098141 | Use of silicon containing gas for CD and profile feature enhancements of gate and shallow trench structures | Thomas A. Kamp | 2006-08-29 |
| 6939811 | Apparatus and method for controlling etch depth | Tom A. Kamp, Vijayakumar C. Venugopal | 2005-09-06 |
| 6649996 | In situ and ex situ hardmask process for STI with oxide collar application | Fandayani Soesilo | 2003-11-18 |
| 6432832 | Method of improving the profile angle between narrow and wide features | Yosias Melaku | 2002-08-13 |
| 6344105 | Techniques for improving etch rate uniformity | John Daugherty, Neil Benjamin, Jeff A. Bogart, Vahid Vahedi, David Cooperberg +1 more | 2002-02-05 |
| 6287974 | Method of achieving top rounding and uniform etch depths while etching shallow trench isolation features | — | 2001-09-11 |
| 6225234 | In situ and ex situ hardmask process for STI with oxide collar application | Fandayani Soesilo | 2001-05-01 |
| 6218309 | Method of achieving top rounding and uniform etch depths while etching shallow trench isolation features | Vahid Vahedi | 2001-04-17 |
| 6162910 | Process for preparing lipophilic oligosaccharide antibiotics | John K. Jenkins | 2000-12-19 |