Issued Patents All Time
Showing 1–16 of 16 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9865472 | Fabrication of a silicon structure and deep silicon etch with profile control | Robert Chebi, Jaroslaw W. Winniczek, Wan-Lin Chen, Erin Moore, Lily Zheng +3 more | 2018-01-09 |
| 9330926 | Fabrication of a silicon structure and deep silicon etch with profile control | Robert Chebi, Jaroslaw W. Winniczek, Wan-Lin Chen, Erin McDonnell, Lily Zheng +3 more | 2016-05-03 |
| 8871105 | Method for achieving smooth side walls after Bosch etch process | Jaroslaw W. Winniczek, Alan J. Miller, Qing Xu, Seongjun Heo, Jin-Hwan Ham +2 more | 2014-10-28 |
| 8668805 | Line end shortening reduction during etch | Gowri Kota, Qinghua Zhong | 2014-03-11 |
| 8609548 | Method for providing high etch rate | Qing Xu, Camelia Rusu, Jaroslaw W. Winniczek, Alan J. Miller | 2013-12-17 |
| 8480913 | Plasma processing method and apparatus with control of plasma excitation power | Tuqiang Ni, Weinan Jiang, Chung-Ho Huang | 2013-07-09 |
| 7682980 | Method to improve profile control and N/P loading in dual doped gate applications | Helene Del Puppo, Chris Lee, Vahid Vahedi, Thomas A. Kamp, Alan J. Miller +2 more | 2010-03-23 |
| 7491343 | Line end shortening reduction during etch | Yoko Y. Adams, Gowri Kota, Qinghua Zhong | 2009-02-17 |
| 7407597 | Line end shortening reduction during etch | Gowri Kota, Qinghua Zhong | 2008-08-05 |
| 7186661 | Method to improve profile control and N/P loading in dual doped gate applications | Helene Del Puppo, Chris Lee, Vahid Vahedi, Thomas A. Kamp, Alan J. Miller +2 more | 2007-03-06 |
| 6897156 | Vacuum plasma processor method | Tuqiang Ni, Kenji Takeshita, Tom Choi | 2005-05-24 |
| 6646385 | Plasma excitation coil | Arthur M. Howald, Brian McMillin | 2003-11-11 |
| 6617257 | Method of plasma etching organic antireflective coating | Tuqiang Ni, Weinan Jiang, Conan Chiang, Chris Lee, Dai N. Lee | 2003-09-09 |
| 6531029 | Vacuum plasma processor apparatus and method | Tuqiang Ni, Kenji Takeshita, Tom Choi | 2003-03-11 |
| 6514378 | Method for improving uniformity and reducing etch rate variation of etching polysilicon | Tuqiang Ni, Kenji Takeshita, Tom Choi, Wenli Collison | 2003-02-04 |
| 6441555 | Plasma excitation coil | Arthur M. Howald, Brian McMillin | 2002-08-27 |