Issued Patents All Time
Showing 1–5 of 5 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8668805 | Line end shortening reduction during etch | Frank Y. Lin, Qinghua Zhong | 2014-03-11 |
| 7622051 | Methods for critical dimension control during plasma etching | David Schaefer | 2009-11-24 |
| 7491343 | Line end shortening reduction during etch | Yoko Y. Adams, Frank Y. Lin, Qinghua Zhong | 2009-02-17 |
| 7407597 | Line end shortening reduction during etch | Frank Y. Lin, Qinghua Zhong | 2008-08-05 |
| 7018855 | Process controls for improved wafer uniformity using integrated or standalone metrology | Jorge Luque | 2006-03-28 |