Issued Patents All Time
Showing 1–16 of 16 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9865472 | Fabrication of a silicon structure and deep silicon etch with profile control | Robert Chebi, Frank Y. Lin, Jaroslaw W. Winniczek, Wan-Lin Chen, Erin Moore +3 more | 2018-01-09 |
| 9514955 | Patterning of a hard mask material | Joydeep Guha | 2016-12-06 |
| 9330926 | Fabrication of a silicon structure and deep silicon etch with profile control | Robert Chebi, Frank Y. Lin, Jaroslaw W. Winniczek, Wan-Lin Chen, Erin McDonnell +3 more | 2016-05-03 |
| 9267605 | Pressure control valve assembly of plasma processing chamber and rapid alternating process | Mirzafer Abatchev, Brian McMillin | 2016-02-23 |
| 8871105 | Method for achieving smooth side walls after Bosch etch process | Jaroslaw W. Winniczek, Frank Y. Lin, Alan J. Miller, Qing Xu, Seongjun Heo +2 more | 2014-10-28 |
| 8691698 | Controlled gas mixing for smooth sidewall rapid alternating etch process | Qing Xu, William Thie | 2014-04-08 |
| 8609548 | Method for providing high etch rate | Qing Xu, Jaroslaw W. Winniczek, Frank Y. Lin, Alan J. Miller | 2013-12-17 |
| 8574447 | Inorganic rapid alternating process for silicon etch | Tsuyoshi Aso | 2013-11-05 |
| 8440473 | Use of spectrum to synchronize RF switching with gas switching during etch | Qing Xu, Brian McMillin, Alexander Paterson | 2013-05-14 |
| 7785753 | Method and apparatus for providing mask in semiconductor processing | Yoojin KIM, Jonathan Kim | 2010-08-31 |
| 7749353 | High aspect ratio etch using modulation of RF powers of various frequencies | Rajinder Dhindsa, Eric A. Hudson, Mukund Srinivasan, Lumin Li, Felix Kozakevich | 2010-07-06 |
| 7645707 | Etch profile control | Zhisong Huang, Mukund Srinivasan, Eric A. Hudson, Aaron Eppler | 2010-01-12 |
| 7405521 | Multiple frequency plasma processor method and apparatus | Raj Dhindsa, S. M. Reza Sadjadi, Felix Kozakevich, Dave Trussell, Lumin Li +5 more | 2008-07-29 |
| 7341953 | Mask profile control for controlling feature profile | — | 2008-03-11 |
| 7144521 | High aspect ratio etch using modulation of RF powers of various frequencies | Rajinder Dhindsa, Eric A. Hudson, Mukund Srinivasan, Lumin Li, Felix Kozakevich | 2006-12-05 |
| 6942816 | Methods of reducing photoresist distortion while etching in a plasma processing system | Mukund Srinivasan | 2005-09-13 |