Issued Patents All Time
Showing 25 most recent of 57 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12387909 | Low frequency RF generator and associated electrostatic chuck | Alexei Marakhtanov, Bing Ji, Ranadeep Bhowmick, John Holland, Alexander Matyushkin | 2025-08-12 |
| 12362159 | Systems and methods for controlling a plasma sheath characteristic | Alexei Marakhtanov, James Eugene Caron, John Holland, Ranadeep Bhowmick, Bing Ji | 2025-07-15 |
| 12354840 | Systems and methods for optimizing power delivery to an electrode of a plasma chamber | Ranadeep Bhowmick, John Holland, Bing Ji, Alexei Marakhtanov | 2025-07-08 |
| 12340989 | Electrostatic edge ring mounting system for substrate processing | Alexander Matyushkin, Keith Comendant, Adam Mace, Darrell Ehrlich, John Holland +1 more | 2025-06-24 |
| 12308211 | Systems and methods for use of low frequency harmonics in bias radiofrequency supply to control uniformity of plasma process results across substrate | Alexei Marakhtanov, Ranadeep Bhowmick, John Holland | 2025-05-20 |
| 12266505 | Systems and methods for using binning to increase power during a low frequency cycle | Alexei Marakhtanov, Ranadeep Bhowmick, Bing Ji, John Holland | 2025-04-01 |
| 12255052 | Process control for ion energy delivery using multiple generators and phase control | Ranadeep Bhowmick, Alexei Marakhtanov, John Holland, Eric A. Hudson | 2025-03-18 |
| 12183544 | Tuning voltage setpoint in a pulsed RF signal for a tunable edge sheath system | David Hopkins, Bradford J. Lyndaker, Alexei Marakhtanov | 2024-12-31 |
| 12165844 | Uniformity control circuit for impedance match | Alexei Marakhtanov, Bing Ji, John Holland | 2024-12-10 |
| 12131886 | Systems and methods for extracting process control information from radiofrequency supply system of plasma processing system | Ranadeep Bhowmick, Alexei Marakhtanov, John Holland | 2024-10-29 |
| 12080518 | Impedance match with an elongated RF strap | Alexei Marakhtanov, Bing Ji, Ranadeep Bhowmick, John Holland | 2024-09-03 |
| 11935726 | High speed synchronization of plasma source/bias power delivery | Aaron T. Radomski, Benjamin J. Gitlin, Larry J. Fisk, II, Mariusz Oldziej, Aaron Michael Burry +5 more | 2024-03-19 |
| 11935730 | Systems and methods for cleaning an edge ring pocket | Eric A. Hudson, Scott Briggs, John Holland, Alexei Marakhtanov, Kenneth Lucchesi | 2024-03-19 |
| 11908660 | Systems and methods for optimizing power delivery to an electrode of a plasma chamber | Ranadeep Bhowmick, John Holland, Bing Ji, Alexei Marakhtanov | 2024-02-20 |
| 11651991 | Electrostatic Chuck design for cooling-gas light-up prevention | Alexander Matyushkin, Alexei Marakhtanov, John Holland, Keith Gaff | 2023-05-16 |
| 11335539 | Systems and methods for optimizing power delivery to an electrode of a plasma chamber | Ranadeep Bhowmick, John Holland, Bing Ji, Alexei Marakhtanov | 2022-05-17 |
| 11195706 | Systems and methods for achieving a pre-determined factor associated with an edge region within a plasma chamber by synchronizing main and edge RF generators | Alexei Marakhtanov, Michael C. Kellogg, John Holland, Zhigang Chen, Kenneth Lucchesi +1 more | 2021-12-07 |
| 11158488 | High speed synchronization of plasma source/bias power delivery | Aaron T. Radomski, Benjamin J. Gitlin, Larry J. Fisk, II, Mariusz Oldziej, Aaron Michael Burry +5 more | 2021-10-26 |
| 11069553 | Electrostatic chuck with features for preventing electrical arcing and light-up and improving process uniformity | Alexander Matyushkin, John Holland, Harmeet Singh, Alexei Marakhtanov, Keith Gaff +1 more | 2021-07-20 |
| 11024532 | Electrostatic chuck design for cooling-gas light-up prevention | Alexander Matyushkin, Alexei Marakhtanov, John Holland, Keith Gaff | 2021-06-01 |
| 10916409 | Active control of radial etch uniformity | Alexei Marakhtanov, John Holland, Bing Ji, Kenneth Lucchesi | 2021-02-09 |
| 10861708 | Three or more states for achieving high aspect ratio dielectric etch | Takumi Yanagawa, Nikhil Dole, Ranadeep Bhowmick, Eric A. Hudson, John Holland +2 more | 2020-12-08 |
| 10825656 | Systems and methods for controlling directionality of ions in an edge region by using an electrode within a coupling ring | Michael C. Kellogg, Alexei Marakhtanov, John Holland, Zhigang Chen, Kenneth Lucchesi | 2020-11-03 |
| 10615003 | Systems and methods for controlling directionality of ions in an edge region by using an electrode within a coupling ring | Michael C. Kellogg, Alexei Marakhtanov, John Holland, Zhigang Chen, Kenneth Lucchesi | 2020-04-07 |
| 10504744 | Three or more states for achieving high aspect ratio dielectric etch | Takumi Yanagawa, Nikhil Dole, Ranadeep Bhowmick, Eric A. Hudson, John Holland +2 more | 2019-12-10 |