Issued Patents All Time
Showing 26–50 of 57 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10304662 | Multi regime plasma wafer processing to increase directionality of ions | Alexei Marakhtanov, Lin Zhao, Kenneth Lucchesi, Zhigang Chen, John Holland | 2019-05-28 |
| 10283330 | Systems and methods for achieving a pre-determined factor associated with an edge region within a plasma chamber by synchronizing main and edge RF generators | Alexei Marakhtanov, Michael C. Kellogg, John Holland, Zhigang Chen, Kenneth Lucchesi +1 more | 2019-05-07 |
| 10115568 | Systems and methods for controlling directionality of ions in an edge region by using an electrode within a coupling ring | Michael C. Kellogg, Alexei Marakhtanov, John Holland, Zhigang Chen, Kenneth Lucchesi | 2018-10-30 |
| 10115564 | Uniformity control circuit for use within an impedance matching circuit | Alexei Marakhtanov, Kenneth Lucchesi, John Holland | 2018-10-30 |
| 10083853 | Electrostatic chuck design for cooling-gas light-up prevention | Alexander Matyushkin, Alexei Marakhtanov, John Holland, Keith Gaff | 2018-09-25 |
| 10002746 | Multi regime plasma wafer processing to increase directionality of ions | Alexei Marakhtanov, Lin Zhao, Kenneth Lucchesi, Zhigang Chen, John Holland | 2018-06-19 |
| 9984859 | Impedance matching circuit for operation with a kilohertz RF generator and a megahertz RF generator to control plasma processes | Alexei Marakhtanov, John Holland, Brett Jacobs | 2018-05-29 |
| 9852889 | Systems and methods for controlling directionality of ions in an edge region by using an electrode within a coupling ring | Michael C. Kellogg, Alexei Marakhtanov, John Holland, Zhigang Chen, Kenneth Lucchesi | 2017-12-26 |
| 9761414 | Uniformity control circuit for use within an impedance matching circuit | Alexei Marakhtanov, Kenneth Lucchesi, John Holland | 2017-09-12 |
| 9595424 | Impedance matching circuit for operation with a kilohertz RF generator and a megahertz RF generator to control plasma processes | Alexei Marakhtanov, John Holland, Brett Jacobs | 2017-03-14 |
| 8500952 | Plasma confinement rings having reduced polymer deposition characteristics | Rajinder Dhindsa, James Rogers, David Trussell | 2013-08-06 |
| 8299390 | Apparatus and method for controlling plasma density profile | Rajinder Dhindsa, Lumin Li, Dave Trussell | 2012-10-30 |
| 8262922 | Plasma confinement rings having reduced polymer deposition characteristics | Rajinder Dhindsa, James Rogers, David Trussell | 2012-09-11 |
| 8222155 | Selectivity control in a plasma processing system | Kenji Takeshita, Odette Turmel, Eric A. Hudson | 2012-07-17 |
| 8000082 | Electrostatic chuck assembly with dielectric material and/or cavity having varying thickness, profile and/or shape, method of use and apparatus incorporating same | Rajinder Dhindsa, Eric H. Lenz, Lumin Li | 2011-08-16 |
| 7749353 | High aspect ratio etch using modulation of RF powers of various frequencies | Camelia Rusu, Rajinder Dhindsa, Eric A. Hudson, Mukund Srinivasan, Lumin Li | 2010-07-06 |
| 7683289 | Apparatus and method for controlling plasma density profile | Rajinder Dhindsa, Lumin Li, Dave Trussell | 2010-03-23 |
| 7525787 | Electrostatic chuck assembly with dielectric material and/or cavity having varying thickness, profile and/or shape, method of use and apparatus incorporating same | Rajinder Dhindsa, Eric H. Lenz, Lumin Li | 2009-04-28 |
| 7521362 | Methods for the optimization of ion energy control in a plasma processing system | Kenji Takeshita, Odette Turmel, Eric A. Hudson | 2009-04-21 |
| 7430986 | Plasma confinement ring assemblies having reduced polymer deposition characteristics | Rajinder Dhindsa, James Rogers, David Trussell | 2008-10-07 |
| 7405521 | Multiple frequency plasma processor method and apparatus | Raj Dhindsa, S. M. Reza Sadjadi, Dave Trussell, Lumin Li, Eric H. Lenz +5 more | 2008-07-29 |
| 7393432 | RF ground switch for plasma processing system | Rajinder Dhindsa, Eric H. Lenz, Russell Martin | 2008-07-01 |
| 7276135 | Vacuum plasma processor including control in response to DC bias voltage | Rajinder Dhindsa, Dave Trussell | 2007-10-02 |
| 7169256 | Plasma processor with electrode responsive to multiple RF frequencies | Raj Dhindsa, David Trussell | 2007-01-30 |
| 7144521 | High aspect ratio etch using modulation of RF powers of various frequencies | Camelia Rusu, Rajinder Dhindsa, Eric A. Hudson, Mukund Srinivasan, Lumin Li | 2006-12-05 |