Issued Patents All Time
Showing 1–19 of 19 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11764086 | Wafer transport assembly with integrated buffers | John Daugherty, Christopher Pena, Michael C. Kellogg, Klay Kunkel, Richard H. Gould | 2023-09-19 |
| 11393705 | Wafer transport assembly with integrated buffers | John Daugherty, Michael C. Kellogg, Christopher Pena, Richard H. Gould, Klay Kunkel | 2022-07-19 |
| 11112773 | Systems for removing and replacing consumable parts from a semiconductor process module in situ | Alan J. Miller, John Daugherty, Alex Paterson | 2021-09-07 |
| 10804079 | Active showerhead | Mariusch Gregor, Thorsten Lill | 2020-10-13 |
| 10790174 | Wafer transport assembly with integrated buffers | John Daugherty, Michael C. Kellogg, Christopher Pena, Richard H. Gould, Klay Kunkel | 2020-09-29 |
| 10403476 | Active showerhead | Mariusch Gregor, Thorsten Lill | 2019-09-03 |
| 10304707 | Load lock interface and integrated post-processing module | Richard H. Gould, John Daugherty | 2019-05-28 |
| 10014196 | Wafer transport assembly with integrated buffers | John Daugherty, Michael C. Kellogg, Christopher Pena, Richard H. Gould, Klay Kunkel | 2018-07-03 |
| 9929028 | Service tunnel for use on capital equipment in semiconductor manufacturing and research fabs | John Daugherty, Michael C. Kellogg, Christopher Pena, Richard H. Gould, Klay Kunkel | 2018-03-27 |
| 9502275 | Service tunnel for use on capital equipment in semiconductor manufacturing and research fabs | John Daugherty, Michael C. Kellogg, Christopher Pena, Richard H. Gould, Klay Kunkel | 2016-11-22 |
| 8573153 | Multi-part electrode for a semiconductor processing plasma reactor and method of replacing a portion of a multi-part electrode | Andreas Fischer, William S. Kennedy, Peter Loewenhardt | 2013-11-05 |
| 8500952 | Plasma confinement rings having reduced polymer deposition characteristics | Rajinder Dhindsa, Felix Kozakevich, James Rogers | 2013-08-06 |
| 8262922 | Plasma confinement rings having reduced polymer deposition characteristics | Rajinder Dhindsa, Felix Kozakevich, James Rogers | 2012-09-11 |
| 7861667 | Multi-part electrode for a semiconductor processing plasma reactor and method of replacing a portion of a multi-part electrode | Andreas Fischer, William S. Kennedy, Peter Loewenhardt | 2011-01-04 |
| 7430986 | Plasma confinement ring assemblies having reduced polymer deposition characteristics | Rajinder Dhindsa, Felix Kozakevich, James Rogers | 2008-10-07 |
| 7169256 | Plasma processor with electrode responsive to multiple RF frequencies | Raj Dhindsa, Felix Kozakevich | 2007-01-30 |
| RE38097 | Chemical vapor deposition system with a plasma chamber having separate process gas and cleaning gas injection ports | C. Robert Koemtzopoulos, Felix Kozakevich | 2003-04-29 |
| 5988187 | Chemical vapor deposition system with a plasma chamber having separate process gas and cleaning gas injection ports | C. Robert Koemtzopoulos, Felix Kozakevich | 1999-11-23 |
| 5911833 | Method of in-situ cleaning of a chuck within a plasma chamber | Dean R. Denison, William Harshbarger, Anwar Husain, C. Robert Koemtzopoulos, Felix Kozakevich | 1999-06-15 |