Issued Patents All Time
Showing 1–10 of 10 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6326064 | Process for depositing a SiOx film having reduced intrinsic stress and/or reduced hydrogen content | Mark K. Weise | 2001-12-04 |
| 6042901 | Method for depositing fluorine doped silicon dioxide films | James Lam | 2000-03-28 |
| 5911833 | Method of in-situ cleaning of a chuck within a plasma chamber | William Harshbarger, Anwar Husain, C. Robert Koemtzopoulos, Felix Kozakevich, David Trussell | 1999-06-15 |
| 5897711 | Method and apparatus for improving refractive index of dielectric films | — | 1999-04-27 |
| 5869149 | Method for preparing nitrogen surface treated fluorine doped silicon dioxide films | Ajay Saproo, David T. Hodul | 1999-02-09 |
| 5841623 | Chuck for substrate processing and method for depositing a film in a radio frequency biased plasma chemical depositing system | David R. Pirkle, Alain Harrus | 1998-11-24 |
| 5750211 | Process for depositing a SiO.sub.x film having reduced intrinsic stress and/or reduced hydrogen content | Mark K. Weise | 1998-05-12 |
| 5503676 | Apparatus and method for magnetron in-situ cleaning of plasma reaction chamber | Paul Shufflebotham, Larry D. Hartsough | 1996-04-02 |
| 5368646 | Reaction chamber design to minimize particle generation in chemical vapor deposition reactors | Arthur K. Yasuda, Randall S. Mundt, James E. Tappan | 1994-11-29 |
| 5200232 | Reaction chamber design and method to minimize particle generation in chemical vapor deposition reactors | James E. Tappan, Arthur K. Yasuda, Randall S. Mundt | 1993-04-06 |