| 8002896 |
Shadow frame with cross beam for semiconductor equipment |
Sakae Tanaka, Qunhua Wang, Sanjay Yadav, Quanyuan Shang |
2011-08-23 |
$7,598,000 |
| 7915114 |
Low temperature process for TFT fabrication |
Mark Hsiao, Dong-Kil Yim, Takako Takehara, Quanyuan Shang, Woong-Kwon Kim +2 more |
2011-03-29 |
$14,869,000 |
| 7439191 |
Deposition of silicon layers for active matrix liquid crystal display (AMLCD) applications |
Kam S. Law, Quanyuan Shang, Dan Maydan |
2008-10-21 |
$14,890,000 |
| 7300829 |
Low temperature process for TFT fabrication |
Mark Hsiao, Dong-Kil Yim, Takako Takehara, Quanyuan Shang, Woong-Kwon Kim +2 more |
2007-11-27 |
$19,678,000 |
| 7160392 |
Method for dechucking a substrate |
Quanyuan Shang, Robert L. Greene, Ichiro Shimizu |
2007-01-09 |
$17,755,000 |
| 7122962 |
Plasma display panel with a low K dielectric layer |
Kam S. Law, Quanyuan Shang, Takako Takehara, Taekyung Won, Dan Maydan |
2006-10-17 |
$41,269,000 |
| 7086918 |
Low temperature process for passivation applications |
Mark Hsiao, Takako Takehara, Quanyuan Shang |
2006-08-08 |
$12,525,000 |
| 6981508 |
On-site cleaning gas generation for process chamber cleaning |
Quanyuan Shang, Sanjay Yadav, Kam S. Law |
2006-01-03 |
$78,745,000 |
| 6962732 |
Process for controlling thin film uniformity and products produced thereby |
Tae Kyung Won, Takako Takehara |
2005-11-08 |
$32,610,000 |
| 6960263 |
Shadow frame with cross beam for semiconductor equipment |
Sakae Tanaka, Qunhua Wang, Sanjay Yadav, Quanyuan Shang |
2005-11-01 |
$24,431,000 |
| 6880561 |
Fluorine process for cleaning semiconductor process chamber |
Haruhiro Harry Goto, Quanyuan Shang, Kam S. Law |
2005-04-19 |
$20,507,000 |
| 6869838 |
Deposition of passivation layers for active matrix liquid crystal display (AMLCD) applications |
Kam S. Law, Quanyuan Shang, Dan Maydan |
2005-03-22 |
$21,686,000 |
| 6863077 |
Method and apparatus for enhanced chamber cleaning |
Sheng Sun, Quanyuan Shang, Robert I. Greene |
2005-03-08 |
$23,793,000 |
| 6858548 |
Application of carbon doped silicon oxide film to flat panel industry |
Tae Kyung Won, Quanyuan Shang |
2005-02-22 |
$18,056,000 |
| 6843258 |
On-site cleaning gas generation for process chamber cleaning |
Quanyuan Shang, Sanjay Yadav, Kam S. Law |
2005-01-18 |
$25,041,000 |
| 6827987 |
Method of reducing an electrostatic charge on a substrate during a PECVD process |
Tae Kyung Won, Soo Young Choi, Takako Takehara |
2004-12-07 |
$16,454,000 |
| 6825134 |
Deposition of film layers by alternately pulsing a precursor and high frequency power in a continuous gas flow |
Kam S. Law, Quanyuan Shang, Dan Maydan, Soo Young Choi, Beom Soo Park +2 more |
2004-11-30 |
$15,899,000 |
| 6676761 |
Method and apparatus for dechucking a substrate |
Quanyuan Shang, Robert L. Greene, Ichiro Shimizu |
2004-01-13 |
$26,561,000 |
| 6610374 |
Method of annealing large area glass substrates |
Chuang-Chuang Tsai, Takako Takehara, Regina Qiu, Yvonne LeGrice, Robert Robertson |
2003-08-26 |
$79,744,000 |
| 6610354 |
Plasma display panel with a low k dielectric layer |
Kam S. Law, Quanyuan Shang, Takako Takehara, Taekyung Won, Dan Maydan |
2003-08-26 |
$79,744,000 |
| 6500356 |
Selectively etching silicon using fluorine without plasma |
Haruhiro Harry Goto, Kam S. Law |
2002-12-31 |
$23,154,000 |
| 6451390 |
Deposition of TEOS oxide using pulsed RF plasma |
Haruhiro Harry Goto, Takako Takehara, Carl A. Sorensen, Kam S. Law |
2002-09-17 |
$18,500,000 |
| 6432255 |
Method and apparatus for enhancing chamber cleaning |
Sheng Sun, Quanyuan Shang, Robert I. Greene |
2002-08-13 |
$22,156,000 |
| 6352910 |
Method of depositing amorphous silicon based films having controlled conductivity |
Takako Takehara, Jeff Olsen, Regina Qiu, Yvonne LeGrice, Guofu J. Feng +2 more |
2002-03-05 |
|
| 6294219 |
Method of annealing large area glass substrates |
Chuang-Chuang Tsai, Takako Takehara, Regina Qiu, Yvonne LeGrice, Robert Robertson |
2001-09-25 |
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