Issued Patents All Time
Showing 25 most recent of 31 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8002896 | Shadow frame with cross beam for semiconductor equipment | Sakae Tanaka, Qunhua Wang, Sanjay Yadav, Quanyuan Shang | 2011-08-23 |
| 7915114 | Low temperature process for TFT fabrication | Mark Hsiao, Dong-Kil Yim, Takako Takehara, Quanyuan Shang, Woong-Kwon Kim +2 more | 2011-03-29 |
| 7439191 | Deposition of silicon layers for active matrix liquid crystal display (AMLCD) applications | Kam S. Law, Quanyuan Shang, Dan Maydan | 2008-10-21 |
| 7300829 | Low temperature process for TFT fabrication | Mark Hsiao, Dong-Kil Yim, Takako Takehara, Quanyuan Shang, Woong-Kwon Kim +2 more | 2007-11-27 |
| 7160392 | Method for dechucking a substrate | Quanyuan Shang, Robert L. Greene, Ichiro Shimizu | 2007-01-09 |
| 7122962 | Plasma display panel with a low K dielectric layer | Kam S. Law, Quanyuan Shang, Takako Takehara, Taekyung Won, Dan Maydan | 2006-10-17 |
| 7086918 | Low temperature process for passivation applications | Mark Hsiao, Takako Takehara, Quanyuan Shang | 2006-08-08 |
| 6981508 | On-site cleaning gas generation for process chamber cleaning | Quanyuan Shang, Sanjay Yadav, Kam S. Law | 2006-01-03 |
| 6962732 | Process for controlling thin film uniformity and products produced thereby | Tae Kyung Won, Takako Takehara | 2005-11-08 |
| 6960263 | Shadow frame with cross beam for semiconductor equipment | Sakae Tanaka, Qunhua Wang, Sanjay Yadav, Quanyuan Shang | 2005-11-01 |
| 6880561 | Fluorine process for cleaning semiconductor process chamber | Haruhiro Harry Goto, Quanyuan Shang, Kam S. Law | 2005-04-19 |
| 6869838 | Deposition of passivation layers for active matrix liquid crystal display (AMLCD) applications | Kam S. Law, Quanyuan Shang, Dan Maydan | 2005-03-22 |
| 6863077 | Method and apparatus for enhanced chamber cleaning | Sheng Sun, Quanyuan Shang, Robert I. Greene | 2005-03-08 |
| 6858548 | Application of carbon doped silicon oxide film to flat panel industry | Tae Kyung Won, Quanyuan Shang | 2005-02-22 |
| 6843258 | On-site cleaning gas generation for process chamber cleaning | Quanyuan Shang, Sanjay Yadav, Kam S. Law | 2005-01-18 |
| 6827987 | Method of reducing an electrostatic charge on a substrate during a PECVD process | Tae Kyung Won, Soo Young Choi, Takako Takehara | 2004-12-07 |
| 6825134 | Deposition of film layers by alternately pulsing a precursor and high frequency power in a continuous gas flow | Kam S. Law, Quanyuan Shang, Dan Maydan, Soo Young Choi, Beom Soo Park +2 more | 2004-11-30 |
| 6676761 | Method and apparatus for dechucking a substrate | Quanyuan Shang, Robert L. Greene, Ichiro Shimizu | 2004-01-13 |
| 6610354 | Plasma display panel with a low k dielectric layer | Kam S. Law, Quanyuan Shang, Takako Takehara, Taekyung Won, Dan Maydan | 2003-08-26 |
| 6610374 | Method of annealing large area glass substrates | Chuang-Chuang Tsai, Takako Takehara, Regina Qiu, Yvonne LeGrice, Robert Robertson | 2003-08-26 |
| 6500356 | Selectively etching silicon using fluorine without plasma | Haruhiro Harry Goto, Kam S. Law | 2002-12-31 |
| 6451390 | Deposition of TEOS oxide using pulsed RF plasma | Haruhiro Harry Goto, Takako Takehara, Carl A. Sorensen, Kam S. Law | 2002-09-17 |
| 6432255 | Method and apparatus for enhancing chamber cleaning | Sheng Sun, Quanyuan Shang, Robert I. Greene | 2002-08-13 |
| 6352910 | Method of depositing amorphous silicon based films having controlled conductivity | Takako Takehara, Jeff Olsen, Regina Qiu, Yvonne LeGrice, Guofu J. Feng +2 more | 2002-03-05 |
| 6294219 | Method of annealing large area glass substrates | Chuang-Chuang Tsai, Takako Takehara, Regina Qiu, Yvonne LeGrice, Robert Robertson | 2001-09-25 |