Issued Patents All Time
Showing 1–19 of 19 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8114484 | Plasma enhanced chemical vapor deposition technology for large-size processing | Ya-Tang Yang, Tae Kyung Won, Soo Young Choi, John M. White | 2012-02-14 |
| 7923354 | Methods for depositing a microcrystalline silicon film for a photovoltaic device | Soo Young Choi, John M. White, Yong Kee Chae | 2011-04-12 |
| 7915114 | Low temperature process for TFT fabrication | Mark Hsiao, Dong-Kil Yim, Quanyuan Shang, William Harshbarger, Woong-Kwon Kim +2 more | 2011-03-29 |
| 7655542 | Methods and apparatus for depositing a microcrystalline silicon film for photovoltaic device | Soo Young Choi, John M. White, Yong Kee Chae | 2010-02-02 |
| 7648892 | Methods and apparatus for depositing a microcrystalline silicon film for photovoltaic device | Soo Young Choi, John M. White, Yong Kee Chae | 2010-01-19 |
| 7432201 | Hybrid PVD-CVD system | Sheng Sun, John M. White | 2008-10-07 |
| 7300829 | Low temperature process for TFT fabrication | Mark Hsiao, Dong-Kil Yim, Quanyuan Shang, William Harshbarger, Woong-Kwon Kim +2 more | 2007-11-27 |
| 7122962 | Plasma display panel with a low K dielectric layer | Kam S. Law, Quanyuan Shang, Taekyung Won, William Harshbarger, Dan Maydan | 2006-10-17 |
| 7086918 | Low temperature process for passivation applications | Mark Hsiao, Quanyuan Shang, William Harshbarger | 2006-08-08 |
| 6962732 | Process for controlling thin film uniformity and products produced thereby | Tae Kyung Won, William Harshbarger | 2005-11-08 |
| 6827987 | Method of reducing an electrostatic charge on a substrate during a PECVD process | Tae Kyung Won, Soo Young Choi, William Harshbarger | 2004-12-07 |
| 6610354 | Plasma display panel with a low k dielectric layer | Kam S. Law, Quanyuan Shang, Taekyung Won, William Harshbarger, Dan Maydan | 2003-08-26 |
| 6610374 | Method of annealing large area glass substrates | Chuang-Chuang Tsai, Regina Qiu, Yvonne LeGrice, William Harshbarger, Robert Robertson | 2003-08-26 |
| 6451390 | Deposition of TEOS oxide using pulsed RF plasma | Haruhiro Harry Goto, Carl A. Sorensen, William Harshbarger, Kam S. Law | 2002-09-17 |
| 6352910 | Method of depositing amorphous silicon based films having controlled conductivity | William Harshbarger, Jeff Olsen, Regina Qiu, Yvonne LeGrice, Guofu J. Feng +2 more | 2002-03-05 |
| 6294219 | Method of annealing large area glass substrates | Chuang-Chuang Tsai, Regina Qiu, Yvonne LeGrice, William Harshbarger, Robert Robertson | 2001-09-25 |
| 6172322 | Annealing an amorphous film using microwave energy | Quanyuan Shang, Robert Robertson, Kam S. Law, Taekyung Won, Sheng Sun | 2001-01-09 |
| 5567476 | Multi-step chemical vapor deposition method for thin film transistors | Kam S. Law, Robert Robertson, Michael Kollrack, Angela Lee, Guofu J. Feng +1 more | 1996-10-22 |
| 5441768 | Multi-step chemical vapor deposition method for thin film transistors | Kam S. Law, Robert Robertson, Michael Kollrack, Angela Lee, Guofu J. Feng +1 more | 1995-08-15 |