Issued Patents All Time
Showing 25 most recent of 71 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10333104 | Method and apparatus for encapsulation of an organic light emitting diode | Craig L. Stevens, Masato Toshima | 2019-06-25 |
| 9287152 | Auto-sequencing multi-directional inline processing method | Wendell T. Blonigan, Masato Toshima, David E. Berkstresser, Steve Kleinke, Craig L. Stevens | 2016-03-15 |
| 8672603 | Auto-sequencing inline processing apparatus | Wendell T. Blonigan, Masato Toshima, David E. Berkstresser, Steve Kleinke, Craig L. Stevens | 2014-03-18 |
| 8617349 | Showerhead assembly for plasma processing chamber | Masato Toshima, Wendell T. Blonigan, Linh X. Can, Robin Law | 2013-12-31 |
| 8444364 | Auto-sequencing multi-directional inline processing apparatus | Wendell T. Blonigan, Masato Toshima, David E. Berkstresser, Steve Kleinke, Craig L. Stevens | 2013-05-21 |
| 7732010 | Method for supporting a glass substrate to improve uniform deposition thickness | Soo Young Choi, Beom Soo Park, Quanyuan Shang, Robert I. Greene, John M. White +2 more | 2010-06-08 |
| 7439191 | Deposition of silicon layers for active matrix liquid crystal display (AMLCD) applications | Quanyuan Shang, William Harshbarger, Dan Maydan | 2008-10-21 |
| 7220685 | Method for depositing porous films | Cecilia Y. Mak | 2007-05-22 |
| 7132374 | Method for depositing porous films | Cecilia Y. Mak | 2006-11-07 |
| 7122962 | Plasma display panel with a low K dielectric layer | Quanyuan Shang, Takako Takehara, Taekyung Won, William Harshbarger, Dan Maydan | 2006-10-17 |
| 7087179 | Optical integrated circuits (ICs) | Cecilia Y. Mak, John M. White, Dan Maydan | 2006-08-08 |
| 7056830 | Method for plasma etching a dielectric layer | Walter R. Merry, Cecilia Y. Mak | 2006-06-06 |
| 7029529 | Method and apparatus for metallization of large area substrates | Robert Z. Bachrach, John M. White, Quanyuan Shang | 2006-04-18 |
| 6981508 | On-site cleaning gas generation for process chamber cleaning | Quanyuan Shang, Sanjay Yadav, William Harshbarger | 2006-01-03 |
| 6902682 | Method and apparatus for electrostatically maintaining substrate flatness | Quanyuan Shang, Robert Robertson, James T. Gardner | 2005-06-07 |
| 6887776 | Methods to form metal lines using selective electrochemical deposition | Quanyuan Shang, John M. White, Robert Z. Bachrach | 2005-05-03 |
| 6880561 | Fluorine process for cleaning semiconductor process chamber | Haruhiro Harry Goto, William Harshbarger, Quanyuan Shang | 2005-04-19 |
| 6869838 | Deposition of passivation layers for active matrix liquid crystal display (AMLCD) applications | Quanyuan Shang, William Harshbarger, Dan Maydan | 2005-03-22 |
| 6857387 | Multiple frequency plasma chamber with grounding capacitor at cathode | Sheng Sun, Jeff Olsen, Sanjay Yadav, Quanyuan Shang | 2005-02-22 |
| 6843258 | On-site cleaning gas generation for process chamber cleaning | Quanyuan Shang, Sanjay Yadav, William Harshbarger | 2005-01-18 |
| 6825134 | Deposition of film layers by alternately pulsing a precursor and high frequency power in a continuous gas flow | Quanyuan Shang, William Harshbarger, Dan Maydan, Soo Young Choi, Beom Soo Park +2 more | 2004-11-30 |
| 6818529 | Apparatus and method for forming a silicon film across the surface of a glass substrate | Robert Z. Bachrach | 2004-11-16 |
| 6647993 | Surface-treated shower head for use in a substrate processing chamber | Quanyuan Shang, Sheng Sun, Emanuel Beer | 2003-11-18 |
| 6610354 | Plasma display panel with a low k dielectric layer | Quanyuan Shang, Takako Takehara, Taekyung Won, William Harshbarger, Dan Maydan | 2003-08-26 |
| 6500265 | Apparatus for electrostatically maintaining subtrate flatness | Quanyuan Shang, Robert Robertson, James T. Gardner | 2002-12-31 |