Issued Patents All Time
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6857387 | Multiple frequency plasma chamber with grounding capacitor at cathode | Sheng Sun, Sanjay Yadav, Quanyuan Shang, Kam S. Law | 2005-02-22 |
| 6352910 | Method of depositing amorphous silicon based films having controlled conductivity | William Harshbarger, Takako Takehara, Regina Qiu, Yvonne LeGrice, Guofu J. Feng +2 more | 2002-03-05 |
| 6207304 | Method of forming silicon oxy-nitride films by plasma-enhanced chemical vapor deposition | Kam S. Law | 2001-03-27 |
| 6024044 | Dual frequency excitation of plasma for film deposition | Kam S. Law, Robert Robertson, Quanyuan Shang, Carl A. Sorensen | 2000-02-15 |
| 5928732 | Method of forming silicon oxy-nitride films by plasma-enhanced chemical vapor deposition | Kam S. Law | 1999-07-27 |