| 11026663 |
Ultrasound imaging apparatus and methods |
John Fothergill |
2021-06-08 |
|
| 7438228 |
Systems and methods for managing electronic prescriptions |
Scott Paul Robertson, Harikrishna Madanaraj, Marappan Ramachandran |
2008-10-21 |
|
| 6902682 |
Method and apparatus for electrostatically maintaining substrate flatness |
Quanyuan Shang, Kam S. Law, James T. Gardner |
2005-06-07 |
$26,348,000 |
| 6610374 |
Method of annealing large area glass substrates |
Chuang-Chuang Tsai, Takako Takehara, Regina Qiu, Yvonne LeGrice, William Harshbarger |
2003-08-26 |
$79,744,000 |
| 6500265 |
Apparatus for electrostatically maintaining subtrate flatness |
Quanyuan Shang, Kam S. Law, James T. Gardner |
2002-12-31 |
$23,154,000 |
| 6468601 |
Apparatus and method for white powder reduction in silicon nitride deposition using remote plasma source cleaning technology |
Quanyuan Shang, Kam S. Law, Dan Maydan |
2002-10-22 |
|
| 6444277 |
Method for depositing amorphous silicon thin films onto large area glass substrates by chemical vapor deposition at high deposition rates |
Kam S. Law, Pamela Lou, Marc M. Kollrack, Angela Lee, Dan Maydan |
2002-09-03 |
$21,151,000 |
| 6355108 |
Film deposition using a finger type shadow frame |
Tae Kyung Won, Quanyuan Shang, Soo Young Choi, Kam S. Law, Robert I. Greene +1 more |
2002-03-12 |
|
| 6352910 |
Method of depositing amorphous silicon based films having controlled conductivity |
William Harshbarger, Takako Takehara, Jeff Olsen, Regina Qiu, Yvonne LeGrice +2 more |
2002-03-05 |
|
| 6338874 |
Method for multilayer CVD processing in a single chamber |
Kam S. Law, Pamela Lou, Marc M. Kollrack, Angela Lee, Dan Maydan |
2002-01-15 |
$237,817,000 |
| 6294219 |
Method of annealing large area glass substrates |
Chuang-Chuang Tsai, Takako Takehara, Regina Qiu, Yvonne LeGrice, William Harshbarger |
2001-09-25 |
|
| 6177023 |
Method and apparatus for electrostatically maintaining substrate flatness |
Quanyuan Shang, Kam S. Law, James T. Gardner |
2001-01-23 |
|
| 6172322 |
Annealing an amorphous film using microwave energy |
Quanyuan Shang, Kam S. Law, Takako Takehara, Taekyung Won, Sheng Sun |
2001-01-09 |
|
| 6055927 |
Apparatus and method for white powder reduction in silicon nitride deposition using remote plasma source cleaning technology |
Quanyuan Shang, Kam S. Law, Dan Maydan |
2000-05-02 |
|
| 6024044 |
Dual frequency excitation of plasma for film deposition |
Kam S. Law, Quanyuan Shang, Jeff Olsen, Carl A. Sorensen |
2000-02-15 |
|
| 5902650 |
Method of depositing amorphous silicon based films having controlled conductivity |
Jeff Feng, Kam S. Law |
1999-05-11 |
|
| 5861197 |
Deposition of high quality conformal silicon oxide thin films on glass substrates |
Kam S. Law, Guofu J. Feng |
1999-01-19 |
$64,501,000 |
| 5851602 |
Deposition of high quality conformal silicon oxide thin films for the manufacture of thin film transistors |
Kam S. Law, Jeffrey Feng |
1998-12-22 |
$39,449,000 |
| 5589233 |
Single chamber CVD process for thin film transistors |
Kam S. Law, Guofu J. Feng |
1996-12-31 |
$20,938,000 |
| 5567476 |
Multi-step chemical vapor deposition method for thin film transistors |
Kam S. Law, Michael Kollrack, Angela Lee, Takako Takehara, Guofu J. Feng +1 more |
1996-10-22 |
|
| 5441768 |
Multi-step chemical vapor deposition method for thin film transistors |
Kam S. Law, Michael Kollrack, Angela Lee, Takako Takehara, Guofu J. Feng +1 more |
1995-08-15 |
$36,280,000 |
| 5399387 |
Plasma CVD of silicon nitride thin films on large area glass substrates at high deposition rates |
Kam S. Law, Pamela Lou, Marc M. Kollrack, Angela Lee, Dan Maydan |
1995-03-21 |
$17,444,000 |
| 5380566 |
Method of limiting sticking of body to susceptor in a deposition treatment |
Marc M. Kollrack, Angela Lee, Kam S. Law, Dan Maydan |
1995-01-10 |
$13,170,000 |
| 5366585 |
Method and apparatus for protection of conductive surfaces in a plasma processing reactor |
Kam S. Law, John M. White |
1994-11-22 |
$22,320,000 |
| 5359445 |
Fiber optic sensor |
— |
1994-10-25 |
$4,819,000 |
