{"@context": "https://schema.org", "@type": "BreadcrumbList", "itemListElement": [{"@type": "ListItem", "position": 1, "name": "Home", "item": "https://www.patentleaderboard.com/"}, {"@type": "ListItem", "position": 2, "name": "Multi-step chemical vapor deposition method for thin film transistors", "item": "https://www.patentleaderboard.com/patent/5567476"}]}

Home › Multi-step chemical vapor deposition method for thin film transistors

Multi-step chemical vapor deposition method for thin film transistors

US Patent 5567476 · Granted Oct 22, 1996

Assignee

Applied Komatsu Technology

Inventors

Kam S. Law (71 patents)
Robert Robertson (26 patents)
Michael Kollrack (2 patents)
Angela Lee (7 patents)
Takako Takehara (19 patents)
Guofu J. Feng (7 patents)
Dan Maydan (101 patents)

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