{"@context": "https://schema.org", "@type": "BreadcrumbList", "itemListElement": [{"@type": "ListItem", "position": 1, "name": "Home", "item": "https://www.patentleaderboard.com/"}, {"@type": "ListItem", "position": 2, "name": "Multi-step chemical vapor deposition method for thin film transistors", "item": "https://www.patentleaderboard.com/patent/5441768"}]}

Home › Multi-step chemical vapor deposition method for thin film transistors

Multi-step chemical vapor deposition method for thin film transistors

US Patent 5441768 · Granted Aug 15, 1995

Estimated economic value: $36,280,000 ⓘ

Assignee

Applied Materials

Inventors

Kam S. Law (71 patents)
Robert Robertson (26 patents)
Michael Kollrack (2 patents)
Angela Lee (7 patents)
Takako Takehara (19 patents)
Guofu J. Feng (7 patents)
Dan Maydan (101 patents)

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