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Home › Apparatus and method for white powder reduction in silicon nitride deposition using remote plasma source cleaning technology

Apparatus and method for white powder reduction in silicon nitride deposition using remote plasma source cleaning technology

US Patent 6055927 · Granted May 2, 2000

Assignee

Applied Komatsu Technology

Inventors

Quanyuan Shang (57 patents)
Robert Robertson (26 patents)
Kam S. Law (71 patents)
Dan Maydan (101 patents)

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